Preparation method for realizing graphical ZnO nanowire arrays by micro-contact printing
A nanowire array and patterning technology, which is applied in the direction of nanostructure manufacturing, pattern surface photolithography, nanotechnology, etc., can solve the problems of poor quality of ZnO nanowires, large pattern size, harsh conditions, etc., and achieve clear patterns , the effect of small cell size
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[0020] The present invention will be further described below in conjunction with examples, but not intended to limit the present invention.
[0021] Example:
[0022] The preparation of ZnO seed layer thin film: first prepare the ethanol solution of 5mmol / L zinc acetate, take ITO conductive glass as the substrate, adopt 2000rmp, 30s spin process continuous spin coating 5 times; heat treatment repeated 2 times); finally put it into a furnace to raise the temperature to 300°C at a rate of 3°C / min, and anneal at this temperature for 0.5-1h to obtain a ZnO seed layer.
[0023] TiO 2 Preparation of sol ink: first, add 4ml of tetrabutyl titanate dropwise to 16ml of ethylene glycol methyl ether under magnetic stirring, and stir evenly; then add 2.5ml of diethanolamine dropwise, and stir magnetically for a long time until mixed uniform.
[0024] The preparation of the patterned ZnO seed layer: first the size is 0.25cm 2 The elastic PDMS stamp was ultrasonically cleaned in absolute...
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