Femtosecond-laser and two-photon polymerization micro-nano machining system and method

Abstract

The invention discloses a femtosecond-laser and two-photon polymerization micro-nano machining system and a femtosecond-laser and two-photon polymerization micro-nano machining method. The micro-nano machining system comprises a femtosecond laser device, a reflector path modulation unit, an image taking device, a focusing lens, a displacement table, a computer and a monitoring device, wherein the image taking device is used for carrying out layer-by-layer image taking on a section graph of a three-dimensional micro-nano device to shape the modulated femtosecond laser into parallel beams arrayed according to the section graph of each layer. According to the femtosecond-laser and two-photon polymerization micro-nano machining system and the femtosecond-laser and two-photon polymerization micro-nano machining method, not only can multiple three-dimensional micro-nano devices be simultaneously machined, but also the arbitrary and complex three-dimensional micro-nano devices can be machined layer-by-layer, so that the machining efficiency and the process flow are improved; besides, in a layer-by-layer micro-nano machining process, the displacement table only needs to move along the thickness direction of the section of the micro-nano device, so that not only can the machining efficiency and the process flow be improved, but also positioning accuracy requirements of the displacement table in two-dimensional directions are reduced, then a machining process is simplified, and the difficulty is reduced.

Description

technical field [0001] The invention relates to the technical field of micro-nano processing, in particular to a femtosecond laser two-photon polymerization micro-nano processing system and method. Background technique [0002] With the development of semiconductor microelectronics technology, various micro-nano processing technologies have become an important research content of modern science and technology. Wide range of applications. [0003] In recent years, with the development of laser technology, two-photon absorption technology using femtosecond laser as light source has been introduced into the field of micro-nano processing. This technology uses a femtosecond laser with a longer wavelength as the light source, and focuses the laser beam on the photosensitive material to be processed through the focusing objective lens. The laser intensity is low, and two-photon absorption does not occur. At the same time, due to the low energy of the laser, the corresponding sin...

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Problems solved by technology

[0006] However, the above-mentioned multi-focus parallel processing method is more suitable for mass production of micro-nano devices with periodic structures, but it is still very difficult to mass-produce arbitrarily complex three-dimensional micro-nano devices

During the processing, the focus of each beam of light still needs to move point by point according to the pre-designed trajectory. Usually, the relative displacement between the focus of the femtosecond laser and the photosensitive material is realized by controlling the movement of the translation stage, and the inertia of the translation stage is large, and the response It takes a long time. Therefore, the existing multi-focus parallel processing method has limited improvement in the processing efficiency of making any complex three-dimensional micro-nano devices, and requires high-precision mechanical positioning capabilities in three-dimensional directions, which increases the processing difficulty.

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