Microfluidic device for fluid detection and method for making the same

Abstract

The invention discloses a microfluidic device for fluid detection. The microfluidic device includes a substrate, and a third precipitation material and a fourth precipitation material that are deposited on the substrate in order. Also, the microfluidic device is provided with one or more detection units. One side of the microfluidic device has one or more grooves, in which one or more microflow channels running through the microfluidic device are disposed.

Description

technical field [0001] The invention relates to a microfluidic device for fluid detection and a method for preparing the microfluidic device. Background technique [0002] At present, most microfluidic devices are made of quartz, glass or high molecular polymer, the basic structure is shown in the figure, in which 1 is the main channel for the fluid to flow through on the device, and 2 and 3 are the outlets of the main channel (inlet) or inlet (outlet), in this type of device, the fluid can only flow along the plane of the device, and cannot flow in a direction perpendicular to the plane of the device. [0003] At the same time, CN101708439 and CN101256145 also disclose a device structure with vertical channels, but none of these vertical channels can achieve the effect of penetrating the entire device. The reason for this problem is that in the traditional device preparation process, the glass or quartz material has high hardness, high melting point and relatively high pri...

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Problems solved by technology

[0002] At present, most microfluidic devices are made of quartz, glass or high molecular polymer, the basic structure is shown in the figure, in which 1 is the main channel for the fluid to flow through on the device, and 2 and 3 are the outlets of the main channel (inlet) or inlet (outlet), in this type of device, the fluid can only flow along the plane of the device, and cannot flow in a direction perpendicular to the plane of the device

[0003] At the same time, CN101708439 and CN 101256145 also disclose a device structure with vertical channels, but none of these vertical channels can achieve the effect of penetrating the entire device

The reason for this problem is that in the traditional device preparation process, the glass or quartz material has high hardness, high melting point and relatively high price, especially, due to the traditional etching method, that is, a single dry etching or wet etching method is used. Etching or using one of them as the main method and the other as the auxiliary method, the etching is difficult, so it is difficult to form a deep channel, and it is impossible to form a through structure

The manufacturing processes of polymer devices include hot pressing, molding, injection molding, and laser ablation. These processes are difficult to process small-sized microstructures.

[0004] In short, the existing technology is difficult to process the ideal microstructure, and it is impossible to form a stacked structure of multi-layer materials on the surface of the device (these structures can expand the function of the device). The fluid can only flow along the plane of the device, and cannot flow along the vertical direction The direction of the device plane (or at a certain angle to the normal of the device plane) flows, and the processing efficiency is low, the cost is high, the process repeatability and consistency are poor, and it is difficult to mass produce

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