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Wide-spectrum laser of a quantum well structure

A quantum well and laser technology, applied in the field of broadband lasers, can solve problems such as high threshold current density, low modulation rate, low temperature stability, etc., achieve stable growth conditions, overcome growth difficulties, and achieve stable performance

Inactive Publication Date: 2014-11-26
NANJING QINGCHEN PHOTOELECTRONICS TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this kind of quantum dot and quantum pulse broadband laser has high requirements on the design of the active region, and it is difficult to realize and has poor repeatability.
In addition, materials for quantum dots and quantum pulse broadband lasers need to be grown by molecular beam epitaxy, which also limits their large-scale and large-scale growth.
[0005] Compared with quantum dot lasers and quantum pulse lasers, quantum well lasers have relatively poor photoelectric performance, such as low gain, high threshold current density, low modulation rate and low temperature stability, etc.
Therefore, the research on using quantum well laser as a broadband light source has not made the latest progress.

Method used

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Embodiment Construction

[0028] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0029] figure 1 It is a cross-sectional view of a wide-spectrum laser with a quantum well structure proposed according to the present invention. like figure 1 As shown, the laser consists of sequentially stacked N-type electrode layer 1, N-type substrate 2, N-type buffer layer 3, first N-type heavily doped layer 4, first undoped active region layer 5, second N-type heavily doped layer 6 , second undoped active region layer 7 , P-type heavily doped layer 8 , P-type contact layer 9 and P-type electrode layer 10 .

[0030] The N-type electrode layer 1 can be made of materials capable of forming N-type ohmic contacts, such as Au / Zn or AuGeNi. Its thickness should be set between 150nm-1000nm, preferably 300nm. It can be pr...

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Abstract

The invention discloses a quantum well laser capable of presenting wide spectrum characteristics, and belongs to the field of semiconductor photoelectrons. The laser in the invention comprises an N type electrode, an N type substrate, an N type buffer layer, a first N type heavily doped layer, a first undoped active region, a second N type heavily doped layer, a second undoped active region, a P type heavily doped layer, a P type contact layer and P type electrode which are stacked in sequence. The wide-spectrum laser in the invention introduces a heterojunction between the two active regions, wherein the heterojunction is formed by a heavily doped N layer and an intrinsically doped P layer. Thus a wide-spectrum laser whose active regions are quantum wells can be realized.

Description

technical field [0001] The invention relates to a wide-spectrum laser with quantum well structure, and the device can realize the wide-spectrum laser in the quantum well active area. Background technique [0002] Broad-spectrum light sources have important applications in optical fiber communication, detection and sensing, spectroscopy and biomedical imaging, so the research on broadband light sources has become one of the hot research directions. [0003] The earliest broadband light source was realized through a complex filtering system, but this system required an external high-power laser as a pump light source, which was bulky, expensive, and inconvenient to apply. [0004] The recent practice of broad-spectrum light sources is usually achieved by outputting a wide spectrum from a single laser, that is, a broadband laser. Broad-spectrum lasers can be divided into spontaneous emission broad-spectrum lasers and machine-induced emission broad-spectrum lasers according to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/343
Inventor 酉伟英
Owner NANJING QINGCHEN PHOTOELECTRONICS TECH
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