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Flexible transparent conductive graphene film and manufacturing method and application thereof

A graphene film, transparent and conductive technology, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problems of insufficient graphite oxide reduction process, difference in conductivity, general conductivity, etc., and achieve high conductivity , high conductivity, good flexibility

Inactive Publication Date: 2014-12-03
OCEANS KING LIGHTING SCI&TECH CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, chemical vapor deposition (CVD) and high-temperature oxidation film formation are usually used to prepare graphene films. However, graphene films prepared by chemical vapor deposition have general electrical conductivity. As electrodes for OLEDs or organic solar cells, electrodes are expected to The lower the resistance, the better, so as to achieve higher photoelectric conversion performance; and in the high-temperature oxidation film preparation method, due to the insufficient reduction process of graphite oxide, the conductivity of the actually obtained graphene film is different from the theoretical value. there will be a big difference

Method used

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  • Flexible transparent conductive graphene film and manufacturing method and application thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) Take a clean glass substrate with a thickness of 0.1mm and place it in a vapor deposition chamber, feed 600Pa of hydrogen gas, raise the temperature to 800°C, and then feed 500Pa of butane gas to deposit a graphene layer on the glass substrate, The thickness of graphene layer is 200nm, obtains the glass substrate with graphene layer;

[0032] (2) Place the glass substrate with the graphene layer in a vacuum of 10 -4 In the vacuum coating chamber of Pa, the nickel layer is prepared on the graphene layer by electron beam evaporation, and the electron beam energy is 100W / cm 2 , evaporation rate is 0.2nm / s, the thickness of nickel layer is 15nm; Obtain flexible transparent conductive graphene film P1, the structure of P1 is glass substrate / graphene (200nm) / nickel (15nm) / graphene (100nm).

Embodiment 2

[0034] A preparation method for a flexible transparent conductive graphene film, comprising the steps of:

[0035] (1) Take a clean glass substrate with a thickness of 2mm and place it in a vapor deposition chamber, pass in hydrogen gas of 1000Pa, heat up to 1000°C, and then pass in ethane gas of 1000Pa, and deposit a graphene layer on the glass substrate. The thickness of alkene layer is 200nm, obtains the glass substrate with graphene layer;

[0036] (2) Place the glass substrate with the graphene layer in a vacuum of 10 -5 In the vacuum coating chamber of Pa, the gold layer is prepared on the graphene layer by thermal resistance evaporation, the evaporation rate is 0.5nm / s, and the thickness of the gold layer is 15nm;

[0037] (3) Repeat the method described in steps (1) and (2) to prepare the graphene layer and the gold layer, so that the number of layers of the gold layer is 2 layers, and a flexible transparent conductive graphene film P2 is obtained, and the structure o...

Embodiment 3

[0039] A preparation method for a flexible transparent conductive graphene film, comprising the steps of:

[0040] (1) Take a clean glass substrate with a thickness of 1mm and place it in a vapor deposition chamber, pass in 500Pa of hydrogen gas, heat up to 800°C, and then pass in 500Pa of propane gas to deposit a graphene layer on the glass substrate, graphene The thickness of layer is 100nm, obtains the glass substrate with graphene layer;

[0041] (2) Place the glass substrate with the graphene layer in a vacuum of 10 -4 In the vacuum coating chamber of Pa, the platinum layer is prepared on the graphene layer by electron beam evaporation, and the electron beam energy is 10W / cm 2 , the evaporation rate is 0.01nm / s, and the thickness of the platinum layer is 10nm;

[0042](3) Repeat the method described in steps (1) and (2) to prepare a graphene layer and a platinum layer, so that the number of layers of the platinum layer is 3 layers, and a flexible transparent conductive ...

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Abstract

The invention provides a flexible transparent conductive graphene film and a manufacturing method and application thereof. The flexible transparent conductive graphene film comprises a glass substrate and graphene layers and metal layers sequentially stacked on the glass substrate in a staggered mode. The metal layers are arranged between two adjacent graphene layers. Layers of the metal layers are one to four. The flexible transparent conductive graphene film has high conductivity and light transmittance and good flexibility. The flexible transparent conductive graphene film manufacturing method comprises steps: the graphene layer is firstly manufactured on the glass substrate; the metal layer is then manufactured on the graphene layer; manufacturing of the graphene layer and the metal layer is repeated, and the repeated times of the metal layer is one to four, the graphene layer is finally manufactured, and the flexible transparent conductive graphene film is manufactured.

Description

technical field [0001] The invention relates to a conductive film, in particular to a flexible transparent conductive graphene film and its preparation method and application. Background technique [0002] Graphene is a two-dimensional (2D) periodic honeycomb lattice structure composed of carbon six-membered rings. It has a very high specific surface area and excellent mechanical properties. It is the thinnest known material and the most solid and hard. Graphene has good electrical properties, and the electron mobility at room temperature reaches 15000cm2 / V.S; the special two-dimensional structure of graphene endows it with a series of properties such as perfect quantum tunneling effect and bendability, and is widely used in optoelectronics. devices have a wide range of applications. [0003] At present, chemical vapor deposition (CVD) and high-temperature oxidation film formation are usually used to prepare graphene films. However, graphene films prepared by chemical vapor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/44H01L51/46H01L51/48
CPCH10K71/164H10K30/00H10K30/83H10K30/82Y02E10/549
Inventor 周明杰冯小明黄辉王平
Owner OCEANS KING LIGHTING SCI&TECH CO LTD
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