Cluster magnetorheological polishing pad performance test device and method

A technology of magnetorheological polishing and testing equipment, which is applied in the direction of testing material hardness, grinding/polishing equipment, grinding machine parts, etc., and can solve problems such as inability to compare and analyze normal pressure and shear force

Active Publication Date: 2014-12-10
GUANGDONG UNIV OF TECH
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for a long time, the research on magnetorheological polishing technology has mainly focused on magnetorheological polishing equipment, polishing process, polishing liquid components, etc. There are few studies on the performance of magnetorheological polishing pads. Most of them are through mathematical modeling and theor

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cluster magnetorheological polishing pad performance test device and method
  • Cluster magnetorheological polishing pad performance test device and method
  • Cluster magnetorheological polishing pad performance test device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Example 1: Using a unidirectional piezoelectric sensor to measure the positive pressure of the cluster magnetorheological polishing pad on the workpiece

[0047] Step 1: Embedding clustered cylindrical permanent magnets 5 with an end surface magnetic field strength of 2000Gs on the antimagnetic polishing disc 4 to form a cluster distributed high-gradient magnetic field on the polishing disc surface;

[0048] Step 2: According to carbonyl iron powder (CIPs) 30-40%wt, abrasive grains (diamond powder, silicon carbide, aluminum oxide, cerium oxide, silicon dioxide, etc.) 2-10%wt, deionized water 50-70%wt , Glycerin 8%wt, dispersant 8%wt ratio configuration magnetorheological polishing working fluid, the prepared magnetorheological polishing working fluid is injected into the storage tank, and the magnetorheological polishing working fluid is circulated and stirred by an agitator;

[0049] Step 3: Install the non-magnetic fine duralumin stylus 3 on the miniature piezoelectri...

Embodiment 2

[0053] Example 2: Using a unidirectional piezoelectric sensor to measure the shear force of a cluster magnetorheological polishing pad on a workpiece

[0054] Such as image 3 As shown, the difference between measuring shear force and measuring positive pressure is that the installation position of the piezoelectric sensor is different. The force sensing surface of the piezoelectric sensor is perpendicular to the direction of the shear force. When measuring the shear force along the X-axis, the pressure The force-sensing surface of the electric sensor is perpendicular to the X-axis direction; when measuring the shear force along the Y-axis direction, the force-sensing surface of the piezoelectric sensor is perpendicular to the Y-axis direction, and other steps are the same as in Embodiment 1.

Embodiment 3

[0055] Embodiment 3: Simultaneously measure the normal pressure and shear force of the clustered magnetorheological polishing pads on the workpiece by using bidirectional / tridirectional piezoelectric sensors.

[0056] Such as Figure 4 As shown, the three-way force piezoelectric sensor can be used to simultaneously measure the normal pressure of the cluster magnetorheological polishing pad on the workpiece at a certain point and the components of the shear force along the X and Y directions. The installation method of the sensor is the same as that of Embodiment 1. The signal of Luli can be converted into digital signal by multi-channel A / D conversion card and sent to the computer.

[0057] It can be seen from the above examples that the cluster magnetorheological polishing pad performance test (hardness, elasticity) method of the present invention uses a stylus to measure the local point polishing force, and uses a CNC system to control the movement of the stylus and the poli...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a cluster magnetorheological polishing pad performance test device and method. The test device comprises a CNC machine tool spindle, a piezoelectric sensor, a point gauge, a polishing disk, a magnetic body and a cluster magnetorheological polishing pad, wherein the point gauge is installed on the micro piezoelectric sensor, the piezoelectric sensor is installed on the CNC machine tool spindle, the stress induction face of the piezoelectric sensor is perpendicular to the direction of force measured by the polishing disk, a magnetic field generator is embedded in the polishing disk, magnetorheological polishing working solution is sprayed onto the polishing face of the polishing disk, and the output end of the piezoelectric sensor is connected with a computer through an A/D converter. Due to the test device and method, positive pressure and shearing force of the cluster magnetorheological polishing pad on the point gauge can be accurately measured, the relative positions of the point gauge and the polishing disk are controlled through a CNC system, rotating speed of the polishing disk is adjusted, distribution of polishing force of the cluster magnetorheological polishing pad at different positions and under different states can be measured, changes of the positive pressure and the shearing force in the radial direction and the normal direction are obtained, and performance of the cluster magnetorheological polishing pad can be detected quantitatively.

Description

technical field [0001] The invention relates to a performance test of a polishing pad during cluster magnetorheological plane polishing, in particular to a method for measuring the hardness and elasticity of a cluster magnetorheological polishing pad, which belongs to a method for quantitatively testing and analyzing the performance of a cluster magnetorheological polishing pad. The present invention also relates to a device used in the method for testing the performance of the cluster magnetorheological polishing pad. Background technique [0002] With the development of the microelectronics / optoelectronics industry, there are more and more processing requirements for ultra-smooth surfaces, such as CD / DVD optical read heads, optical / electrical (PD) and electrical / optical (LD) signal converters in optical fiber communications, projection Instruments, laser printers, IC (integrated circuit) chip substrates, optical disc molds, etc. These components require ultra-smooth surfac...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B24B49/16G01N3/40
CPCB24B49/16G01N3/40
Inventor 阎秋生白振伟徐少平陈建新
Owner GUANGDONG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap