A self-zero plane adjustment device and method for focusing and leveling

Abstract

The invention discloses an adjusting device for focusing and leveling a self zero plane, which comprises the components of: a first reflector and a second reflector, wherein the reflecting surfaces of the first reflector and the second reflector are parallel with and opposes each other; and a driving unit which drives the first reflector and the second reflector to simultaneously rotate for a same angle in a same rotating direction, thereby realizing light spot deviation of a focusing and leveling system. The invention simultaneously discloses the focusing and leveling system with the adjusting device for focusing and leveling the self zero plane, and a self zero plane adjusting method.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a focusing and leveling self-zero plane adjustment device and method. Background technique [0002] Lithography equipment is a kind of equipment used in the manufacture of integrated circuits. The use of this equipment includes but is not limited to: integrated circuit manufacturing lithography equipment, liquid crystal panel lithography equipment, photomask marking equipment, MEMS (micro-electromechanical systems) / MOMS (micro-optical machine system) lithography equipment, advanced packaging lithography equipment, printed circuit board lithography equipment and printed circuit board processing equipment, etc. [0003] With the development of integrated circuit manufacturing, the degree of integration is gradually increasing, and the requirements for lithography equipment are also getting higher and higher. As the numerical aperture (NA) of the projecti...

AI Technical Summary

Problems solved by technology

In this case, the structure introduced in the patent US5633721 satisfies the oblique scene imaging condition (sc, scheimpflug's condition) on the projection plane, the silicon wafer plane, and the receiving plane. When the incident angle continues to increase, due to the If the surface is inclined, most of the light will be reflected on the projection surface and the receiving surface, resulting in very weak detected light intensity and affecting the position repeatability accuracy

[0004] At the same time, due to the influence of temperature and other environments, the best focal plane of the objective lens has drifted. If the focus and leveling are not corrected to its own zero plane, the center of the focus and leveling measurement point will not coincide with the exposure field of view of the objective lens, causing measurement errors. (That is, the difference between the actual Z, Rx, Ry of the current exposure field and the Z, Rx, Ry measured by focusing and leveling)

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