Atmosphere bell furnace for ito target sintering

Abstract

The invention discloses a bell-type atmosphere furnace applicable to sintering of ITO targets. The bell-type atmosphere furnace comprises a furnace body, a furnace frame, a cooling system, an atmosphere control and adjustment system and a temperature control system. The furnace body is of a hollow structure mounted on the furnace frame. A cavity in the furnace body is arranged to be a furnace chamber. The bottom of the furnace body is provided with a kiln car serving as a movable furnace door. The kiln car can be connected with the furnace body in a sealed mode when closed as the movable furnace door. The top and the inner walls of the four sides of the furnace chamber are provided with high-temperature refractory layers. The top of the furnace body is provided with heating elements extending downwards into the furnace chamber. A cooling air pipeline of the cooling system penetrates through the sidewall of the bottom of the furnace body and is led into the furnace chamber. A ventilating pipeline of the atmosphere control and adjustment system penetrates through the sidewall of the bottom of the furnace body and is led into the furnace chamber. The temperature control system comprises a plurality of temperature measurement thermocouples mounted on the furnace body. The bell-type atmosphere furnace has the advantages of being simple in structure, low in cost, convenient to maintain, good in sintering effect and particularly applicable to sintering of the ITO targets.

Description

technical field [0001] The invention relates to an industrial sintering furnace, in particular to an atmosphere bell furnace. Background technique [0002] The ITO target material is a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain proportion, processing through a series of production processes, and then sintering in a high-temperature atmosphere (above 1600°C, sintering with oxygen). ITO target is a new type of indium tin oxide special functional ceramic material, which is a high-tech product of deep processing of scattered metal indium. ITO target is one of the most important materials for the production of transparent conductive film glass. In addition, it is expensive and the production process is difficult. It is still a material that is in short supply in the international market. At present, only a few developed countries in the world can produce high-performance ITO targets. material. [0003] According to the curre...

AI Technical Summary

Problems solved by technology

However, due to some inherent defects in the process, the first two preparation methods are difficult to improve the product quality.

The preparation of ITO targets by the sintering process requires a specific sintering furnace, and the maximum temperature of the kiln is required to reach 1600°C. Due to the high technical content of this equipment, the manufacturing technology of this kiln has not yet been mastered in China.

Moreover, the maintenance workload of this high-temperature kiln is very large, and it is difficult to guarantee effective after-sales service in the existing technology

Although some foreign manufacturers have tried to produce this type of sintering furnace, the structure is extremely complicated and the equipment is expensive

Images