Anti-stress-related transcription factors of japonicus japonicus and their coding genes and applications

A technology that encodes genes and transcription factors, which can be used in applications, genetic engineering, plant genetic improvement, etc., and can solve problems such as fundamental improvement of plant stress resistance.

Active Publication Date: 2017-01-18
THE INST OF BIOTECHNOLOGY OF THE CHINESE ACAD OF AGRI SCI
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although some progress has been made in the research of plant stress resistance genetic engineering, the focus is on the introduction of individual functional genes to improve a certain resistance, so that the comprehensive and fundamental improvement of plant stress resistance cannot be achieved.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Anti-stress-related transcription factors of japonicus japonicus and their coding genes and applications
  • Anti-stress-related transcription factors of japonicus japonicus and their coding genes and applications
  • Anti-stress-related transcription factors of japonicus japonicus and their coding genes and applications

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] Example 1 Isolation, Identification and Cloning of LcERF034 Transcription Factor of Lotus japonicus

[0063] 1 Materials and methods

[0064] 1.1 Materials

[0065] 1.1.1 Plant material cultivation and stress treatment

[0066] Using japonicus-"Leo" as the material, select mature, full-bodied seeds that are free from diseases and insect pests, soak them in 0.1% mercuric chloride for 15-20 minutes, rinse them with sterile water for 3 times, dry them, and place the sterilized seeds in B5 for cultivation On the basis, they were cultured in a light incubator for 30 days, treated with 150mM sodium chloride for 12h and 24h, and the leaves were collected and immediately frozen in liquid nitrogen, and stored in a -80°C refrigerator for later use.

[0067] 1.1.2 Strains and plasmids

[0068] Escherichia coli (Escherichia coli): DH5α preserved in the inventor's laboratory

[0069] PMD19-T cloning vector was purchased from TaKaRa Biological Company

[0070] 1.2 Experimental m...

experiment example 1

[0107]Experimental Example 1 Construction of a recombinant plant expression vector containing the LcERF034 gene and its functional verification in Arabidopsis

[0108] 1 Materials and methods

[0109] 1.1 Materials

[0110] 1.1.1 Plant material

[0111] Arabidopsis: Columbia type, preserved by the inventor's laboratory.

[0112] 1.1.2 Strain and carrier

[0113] Escherichia coli (Escherichia coli) DH5α was preserved by the inventor's laboratory; Agrobacterium tumefaciens strain LBA4404 was preserved by the inventor's laboratory; pMD19-T cloning vector was purchased from TaKaRa; gateway entry vector pDNOR201 and expression vector pH7WG2D were purchased from Invitrogen Corporation.

[0114] 1.1.3 Reagents

[0115] Various restriction endonucleases, rTaq enzymes and ExTaq enzymes were purchased from Takara Company; T 4 DNA ligase was purchased from Invitrogen; Taq enzyme was purchased from Beijing Quanshijin Biotechnology Co., Ltd.; Gel / PCR Extraction Kit was purchased fro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
molecular weightaaaaaaaaaa
Login to view more

Abstract

The invention discloses a Lotis corniculatus L. stress resistance related transcription factor and a coding gene and application thereof. The invention also provides the structural domain of an ERF transcription factor shown as SEQ ID NO.3 capable of combining with a cis-acting element and starting expression of the stress resistance response gene. The functional analysis experiment proves that overexpression of the LcERF034 gene in plants can effectively increase or improve the resistance to adversity stress including high salt, drought and low temperature, therefore indicating that the protein encoded by the LcERF034 gene has the function of the ERF transcription factor. The invention further provides application of the transcription factor and the coding gene thereof to the enhancement of adversity stress resistance of plant or the cultivation of adversity stress tolerant transgenic new plant varieties.

Description

technical field [0001] The present invention relates to a transcription factor, in particular to a transcription factor and its encoding gene isolated from lotus corniculatus L. which are related to plant resistance to adversity stress, and the present invention further relates to their application in improving the ability of a plant to resist adversity stress, The invention belongs to the field of ERF transcription factor and its application. Background technique [0002] The problems of soil salinization and secondary salinization are widespread in the world, especially in arid and semi-arid areas, where the problem is more serious. According to incomplete statistics from UNESCO and FAO, the global saline-alkali land area has reached 950 million hm 2 , accounting for about 10% of the total land area of ​​the earth, of which China is 99.13 million hm 2 , accounting for one-ninth of the world's saline soil, equivalent to China's 1.8 billion mu of arable land. In addition,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C12N15/29C12N15/82C07K14/415A01H5/00
Inventor 吴燕民马德宁孙占敏周美亮张永平唐益雄
Owner THE INST OF BIOTECHNOLOGY OF THE CHINESE ACAD OF AGRI SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap