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Preparation method of photoresist stripping liquid

A stripping solution and photoresist technology, applied in the field of photoresist stripping solution preparation, can solve the problems of good phenol oil solubility, inability to strip, poor water solubility, etc., and achieve the effect of good stripping effect and easy removal

Active Publication Date: 2015-02-04
江阴市化学试剂厂有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. O-dichlorobenzene stripping solution, its advantage is that o-dichlorobenzene has good water solubility and oil solubility, but its defect is that it cannot strip metallized metallization. For steaming aluminum and silver stripping, chlorine will Corrosion to aluminum and silver materials, making the product black and deteriorated
[0005] 2. Phenol stripping solution, easy to strip, but because phenol has the defect of good oil solubility and poor water solubility, it is inconvenient for subsequent cleaning after stripping

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] A method for preparing a photoresist stripping solution according to the present invention comprises adding toluene or xylene as a solvent in a batching tank, feeding phenol into it, and mixing;

[0021] Dilute the emulsifier with water, add complexing agent, mix evenly, filter, add the filtered mixed solution of emulsifier and complexing agent into the batching tank, mix thoroughly, filter to obtain the finished product.

[0022] in:

[0023] The emulsifier is made by mixing OP-10 and TX-100 at a ratio of 2:1, and the amount of emulsifier added is 0.2% of phenol.

[0024] The complexing agent is a mixture of diethylenetriaminepentaacetic acid (DTPA) and hydroxyethylethylenediaminetriacetic acid (HEDTA) at a ratio of 1:1, and the addition amount of the complexing agent is 5% of the emulsifier.

[0025] The prepared finished product is used for stripping the photoresist of the aluminum base material, has a good stripping effect, does not corrode the aluminum base materi...

Embodiment 2

[0029] A method for preparing a photoresist stripping solution according to the present invention comprises adding toluene or xylene as a solvent in a batching tank, feeding phenol into it, and mixing;

[0030] Dilute the emulsifier with water, add complexing agent, mix evenly, filter, add the filtered mixed solution of emulsifier and complexing agent into the batching tank, mix thoroughly, filter to obtain the finished product.

[0031] in:

[0032] The emulsifier is made by mixing OP-10 and TX-100 at a ratio of 1:1, and the amount of emulsifier added is 0.1% of phenol.

[0033] The complexing agent is a mixture of diethylenetriaminepentaacetic acid (DTPA) and hydroxyethylethylenediaminetriacetic acid (HEDTA) at a ratio of 1:1, and the addition amount of the complexing agent is 5% of the emulsifier.

[0034] The prepared finished product is used for stripping the photoresist of the aluminum base material, has a good stripping effect, does not corrode the aluminum base materi...

Embodiment 3

[0038] The difference between this embodiment and embodiment 1 is:

[0039] The emulsifier is made by mixing OP-10 and TX-100 at a ratio of 1:2, and the amount of emulsifier added is 0.6% of phenol.

[0040] The prepared finished product is used for stripping the photoresist of the aluminum base material, has a good stripping effect, does not corrode the aluminum base material, and does not cause blackening or deterioration. After peeling off, rinse with water for super easy removal and no residue.

[0041] It is used for the stripping of photoresist on silver substrate, the stripping effect is good, it will not corrode the aluminum substrate, and there will be no blackening or deterioration. After peeling off, rinse with water for super easy removal and no residue.

[0042]

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PUM

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Abstract

The invention relates to a preparation method of photoresist stripping liquid. The preparation method is characterized by comprising the following steps: adding methylbenzene or dimethylbenzene, taken as a solvent, into a batching tank, introducing phenol into the batching tank and mixing; diluting an emulsifying agent with water, then adding a complexing agent into the diluted emulsifying agent, mixing uniformly, filtering, and adding the filtered mixture into the batching tank; and after mixing, filtering, thereby obtaining a finished product, wherein the emulsifying agent is prepared by mixing OP-10 and TX-100 according to a ratio of 0.5-2 to 1, the mass of the added emulsifying agent accounts for 0.1%-0.6% of that of phenol, the complexing agent is prepared by mixing diethylenetriamine pentaacetic acid and hydroxyethyl ethylene diamine triacetic acid according to a mass ratio of 1 to 0.5-2, and the mass of the added complexing agent accounts for 3%-8% of that of the emulsifying agent. The photoresist stripping liquid produced by the preparation method has the advantages of good oil solubility, good water solubility and no erosion to aluminium-silver materials.

Description

technical field [0001] The invention relates to a method for preparing a photoresist stripping solution. Background technique [0002] In the manufacturing process of liquid crystal panels and touch screens, it is also necessary to form multi-layer precise microcircuits on silicon wafers or glass substrates through multiple graphic mask exposure and etching processes. After the microcircuits are formed, they are further stripped with photoresist. The liquid removes the photoresist that coats the protected areas of the microcircuit as a mask. In the production of capacitive touch screens, after sputtering the underlying ITO coating on the glass substrate by vacuum coating, it is necessary to use spin coating to make photoresist layer, exposure, development and demoulding on the ITO glass substrate for many times; liquid crystal display In the manufacturing process of the color filter of the device, in the process of coating photoresist by spin coating, slit coating or slit a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
Inventor 李虎宝翁蕾蕾
Owner 江阴市化学试剂厂有限公司
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