48 results about "Hydroxyethylethylenediaminetriacetic acid" patented technology

A cleaning composition comprises a chelating component. The chelating component is generally selected from the group of methylglycine-N—N-diacetic acid (MGDA), N,N-bis(carboxymethyl)-L-glutamate (GLDA), nitrilotriacetic acid (NTA), hydroxyethylethylenediaminetriacetic acid (HEDTA), ethylenediaminetetraacetic acid (EDTA), diethylenetriaminepentaacetic acid (DTPA), and mixtures thereof. The cleaning composition further comprises a builder component comprising a metal silicate and/or a metal carbonate. The cleaning composition further comprises a solvent component comprising an alkanolamine. The cleaning composition further comprises a polymer component comprising a polyacrylic acid (PAA) and/or an acrylic-maleic copolymer. Optionally, the cleaning composition can further comprise a surfactant component. The cleaning composition is useful for removing tough soil from a ware surface in a dishwasher, such as for removing proteinaceous, carbohydrate, and/or fatty materials from cookware, bakeware, tableware, dishware, flatware, and/or glassware in an automatic dishwasher. A method of forming the cleaning composition is also provided.

The invention provides a chemical copper plating solution. The chemical copper plating solution is prepared from, by mass, 1-10 parts of divalent copper salt, 2-50 parts of reducing agent, 20-100 parts of first complexing agent, 0.001-0.02 part of stabilizer and 0.01-2 parts of second complexing agent and/or surfactant; the first complexing agent is selected from one of or a combination of at least two of tartaric acid, tartrate, ethylenediamine tetraacetic acid, ethylenediaminetetraacetic acid, citric acid, citrate, N-hydroxyethyl ethylenediamine triacetic acid, N-hydroxyethyl ethylenediaminetriacetate, triethanolamine, nitrilotriacetic acid and aminotriacetate; the second complexing agent is selected from one of or a combination of at least two of amino acid, amino acid derivatives, benzothiazole, benzothiazole derivatives, selenium cyanate, tetrahydroxypropyl ethylenediamine and phenanthroline. The chemical copper plating solution can effectively solve the problem that the surfaceof rolled copper foil obtained after electroplating is rough.

A water-addition-type surfactant-based composition, containing: at least one of a fatty acid sodium salt and/or potassium salt, as a surfactant component; and at least one of N,N-bis(carboxymethyl)-L-glutamic acid tetrasodium salt, L -aspartate-(N,N)-diacetic acid tetrasodium salt, N-2-hydroxyethyliminodiacetic acid disodium salt, (S,S)-ethylenediaminesuccinic acid trisodium salt, methylglycinediacetic acid trisodium salt, ethylenediaminetetraacetic acid, nitorilotriacetic acid, diethylenetriaminepentaacetic acid, hydroxyethylethylenediaminetriacetic acid, triethylenetetraminehexaacetic acid, 1,3-propanediaminetetraacetic acid, 1,3-diamino-2-hydroxypropanetetraacetic acid, dihydroxyethylglycine, glycol ether diamine tetraacetic acid, hydroxyethanediphosphonic acid, aminotrimethylenephosphonic acid, 1,2,4-butanetricarboxylic acid, dihydroxyethylethylenediaminediacetic acid, sodium gluconate, sodium glucoheptonate, inositol hexaphosphate, hydroxyethanoic acid, 2-hydroxypropanoic acid, 2-hydroxysuccinic acid, 2,3-dihydroxybutanedioic acid, and 2-hydroxy-1,2,3-propanetricarboxylic acid, as a chelating component.

The invention discloses an anti-depositing citric acid chemical cleaning fluid. An anti-depositing agent PPA is added into a citric acid chemical cleaning fluid formula and accounts for 0.3-2% of the total mass of the anti-depositing citric acid chemical cleaning fluid; the anti-depositing agent PPA is an organic mixture and consists of 10%-30% of a complexing agent, 5%-10% of a surfactant and the balance of water; the complexing agent is one or more then one of gluconic acid, tartaric acid, polyacrylic acid, (2-hydroxyethyl)ethylenediamine-N, N', N'-triacetic acid, iminodiacetic acid and ethylene diamine tetra (methylene phosphonic acid) sodium, and if the complexing agent is a mixture, the ingredients in the mixture are in an arbitrary ratio; and the surfactant is one or more than one of primary alcobol ethoxylate, sodium diethylhexyl sulfosuccinate and sodium diethylhexyl sulfosuccinate, an if the surfactant is a mixture, the ingredients in the mixture an arbitrary ratio. The cleaning fluid is capable of preventing deposition phenomenon but does not generate more serious corrosion to cleaning materials; and moreover, the use concentration of citric acid can be greatly improved, and the citric acid chemical cleaning of high-scale and low-volume thermal equipment such as superheaters can be smoothly carried out.

The invention discloses a high-efficiency decontamination water-based cleaning agent which is prepared from a surfactant, a defoaming agent, an emulsifying agent, an organic builder, a corrosion inhibitor, a chelating agent and water. The surfactant is alkylphenol polyoxyethylene ether, the defoaming agent is polyoxypropylene glycerol ether, the emulsifying agent is dioctyl sodium sulfosuccinate, the organic builder is sodium citrate, the corrosion inhibitor is polyaspartic acid, and the chelating agent is hydroxyethyl ethylenediamine triacetic acid. By being prepared from the surfactant, the defoaming agent, the emulsifying agent, the organic builder, the corrosion inhibitor, the chelating agent and the water, the cleaning agent has the advantages of being high in cleaning efficiency, good in detergency, wide in cleaning range, good in quality, low in cost, good in safety and good in using effect.

The invention discloses a selenium-rich mushroom collagen culture medium. The selenium-rich mushroom collagen culture medium is prepared from, by weight, 0.3-0.4 part of selenomethionine, 2-3 parts of selenium-enriched yeast, 30-32 parts of cottonseed meal, 24-26 parts of buckwheat hull, 1.3-1.6 parts of hydroxyethyl ethylenediamine triacetic acid, 1-2 parts of nickel sulfate, 3-5 parts of calcium hydrophosphate, 5-6 parts of talcum powder, 44-48 parts of pigskin waste, 2-3 parts of sodium chloride powder, a proper amount of acetum with the pH being 2.5, a proper amount of a sodium hydroxide solution and a proper amount of water. According to the selenium-rich mushroom collagen culture medium, the selenium-enriched yeast, selenomethionine and other organic selenium sources are added and integrated into the culture medium through a high-temperature chelation process, contamination possibly generated by yeast serving as infectious microbe is avoided, the selenium-rich mushroom collagen culture medium can be efficiently absorbed by mushrooms, the high-toxicity risk of added inorganic selenium is avoided, and the selenium-rich mushroom collagen culture medium has a good promoting function on increasing the nutritive value of the mushrooms and the economic benefits of mushroom culture.

The invention provides an alkaline cleaner special for a reverse osmosis membrane. The alkaline cleaner special for the reverse osmosis membrane comprises nitrilotriacetic acid salt, complexonate, hydroxyethyl ethylene diamine, (2-Hydroxyethyl) ethylenediaminetriacetic acid salt, alcamines, a dispersant, a pH conditioning agent and deionized water, wherein the mass ratio of nitrilotriacetic acid salt, complexonate, hydroxyethyl ethylene diamine, (2-Hydroxyethyl) ethylenediaminetriacetic acid salt, alcamines, the dispersant to the pH conditioning agent is 1-10 to 2-10 to 2-15 to 10-40 to 10-30 to 2-10 and the balance is deionized water. The invention further provides an application method for the alkalinity cleaning agent special for the reverse osmosis membrane. The alkaline cleaner is convenient to use and excellent in effect, and causes no harm to membrane components.

The invention discloses a production technology and application of a high-efficiency heavy-metal eluent for soil, and belongs to the field of environmental protection. The technology is realized by the following steps: adding ethylenediamine disuccinic acid, ammonium citrate, glycolic acid, nitrilotriacetic acid, hydroxyethyl ethylenediamine triacetic acid and ethylenediamine tetraacetic acid intodistilled water, carrying out stirring for dissolving, carrying out proper heating for full dissolving, then adding hydrochloric acid and potassium chloride, and uniformly carrying out stirring to obtain the heavy-metal eluent. The heavy-metal eluent can applied to soil polluted by heavy metals, and can remove the heavy metals in the soil by leaching, thereby eliminating the pollution of the heavy metals to the soil, protecting the soil, protecting underground water and protecting food safety.

The invention relates to the technical field of metal surface treatment, and discloses a stainless steel surface hydrophilic treatment method. The stainless steel surface hydrophilic treatment methodcomprises the following steps that (1) an agent A is evenly coated on the surface of a steel plate, and a standing reaction is made for 10-30 minutes; (2) an agent B is evenly coated on the surface ofthe stainless steel, and a standing reaction is made for 10-30 minutes; and (3) the surface of the stainless steel is rinsed with water, and the water is dried. The agent A includes one or more of phytic acid, ethylene diamine tetraacetic acid, hydroxyethyl ethylenediamine triacetic acid, dihydroxyethyl glycine, diethylenetriamine pentaacetic acid, nitrilotriacetic acid, iminodisuccinic acid andhydroxy ethyl diphosphonic acid; and the agent B is a ferric ion solution. The stainless steel surface hydrophilic treatment method can solve the problems that in the prior art, when the surface of the stainless steel is subjected to the hydrophilic treatment, the processing conditions are harsh, and large-area steel surface treatment is not facilitated.

The invention discloses a high-activity chemical copper plating solution and a chemical copper plating method. The high-activity chemical copper plating solution is characterized by mainly consisting of copper salt, a reducing agent, a complexant, a pH regulator and a combined additive, wherein the complexant is one or combination of several of ethylenediamine tetraacetic acid, sodium potassium tartrate, sodium citrate, N-(2-hydroxyethyl)ethylenediaminetriacetic acid, tetrahydroxypropyl ethylenediamine, triethanolamine and nitrilotriacetic acid; the combined additive is combination of N and/or S-containing additives. The high-activity chemical copper plating solution has the advantages of being high plating solution activity, low in operation temperature, good in stability and particularly suitable for the chemical copper plating of surfaces of nonmetal matrixes which are relatively weak in activation degree.

The invention discloses a long-acting water-based metal antirust agent and a preparation method thereof. Dodecyl dicarboxylic acid, carboxymethyl cellulose, inositol hexaphosphate, sodium metasilicate, perfluorocaprylic acid, sodium molybdate, barium titanate, long-chain compound amine boric acid ester, polyethyleneglycol, isopropanol, hydroxyethyl ethylenediamine triacetic acid, 2-ethyl-4-methylimidazole and deionized water are used as raw materials. The preparation method of the long-chain compound amine boric acid ester is improved. All the raw materials are subjected to phased mixed treatment to obtain the water-based metal antirust agent. The long-acting environment-friendly water-based metal antirust agent with the excellent rust-resisting effect is obtained through the preparation method which is simple and easy to operate.

Disclosed are a composite deoxidizing scale inhibitor applied to low-hardness water of a boiler and a preparation method of the composite deoxidizing scale inhibitor. The composite deoxidizing scale inhibitor is prepared from, by weight, 10-30 parts of phytic acid, 6-18 parts of acetaldehyde oxime, 12-22 parts of 3-methoxypropylamine, 15-30 parts of sodium lignosulfonate-maleic anhydride copolymer, 5-20 parts of hydroxyethyl ethylene diamine triacetic acid and 10-40 parts of deionized water. The composite deoxidizing scale inhibitor applied to the low-hardness water of the boiler and the preparation method of the composite deoxidizing scale inhibitor have the advantages that the use of the boiler can be maintained for a long time, calcium and magnesium ions and other metal ions in the water are complexed and filtered out and removed by a filter in a system, and therefore the purpose of softening the water is achieved. The composite deoxidizing scale inhibitor has the advantages of being environmentally friendly, easy to degrade and unlikely to generate secondary pollution after being discharged. The chemical cleaning frequency of the boiler can be effectively reduced, the dischargeof waste liquid is indirectly reduced, the production efficiency is improved, and the environment-friendly production is facilitated. The composite deoxidizing scale inhibitor has excellent scale inhibition performance and high dissolved oxygen removal efficiency.

The invention provides a soak solution used in the watermelon planting process and relates to the technical field of fruit planting and culturing.The soak solution is characterized by being prepared from, by weight, 3 parts of cape jasmine flowers, 9 parts of diammonium phosphate, 8 parts of potassium chloride, 0.5 part of sesame oil, 4 parts of zinc gluconate, 4 parts of bean dregs, 6 parts of egg white, 1 part of hydroxyethyl ethylenediamine triacetic acid, 2 parts of orange juice, 2 parts of coffee beans, 4 parts of figs, 2 parts of minced mutton, 3 parts of carrot blocks, 9 parts of conditioning mixture and 60 parts of purified water.The soak solution is reasonable in method, convenient to operate and reasonable in matching.