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A kind of epitaxial growth method that improves LED luminous efficiency

A technology of epitaxial growth and luminous efficiency, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of low hole migration ability, lack of quantum wells, and inability to migrate, and achieve the effect of improving luminous efficiency

Inactive Publication Date: 2017-04-19
西安利科光电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the multi-quantum well layer is the core of light emission. Generally speaking, the main light-emitting layer of the multi-quantum well layer is a pair or two pairs of quantum wells close to P-GaN, and the remaining quantum wells do not contribute much to the light emission. The main reason is that The mobility of holes is not high, and they cannot effectively migrate from P-GaN to quantum wells to recombine with electrons, so that the quantum wells far away from P-GaN lack sufficient recombination holes to reduce the luminous efficiency.

Method used

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  • A kind of epitaxial growth method that improves LED luminous efficiency
  • A kind of epitaxial growth method that improves LED luminous efficiency

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Embodiment 1

[0029] Example one (invention)

[0030] 1. Put the cleaned sapphire substrate into the MOCVD equipment and bake it at 1100°C for 10 minutes.

[0031] 2. Grow a low-temperature GaN layer with a thickness of 10nm at a temperature of 620°C and a growth pressure of 500torr.

[0032] 3. The temperature is raised to 1165°C to grow an undoped u-GaN layer with a thickness of 1.5um, and the growth pressure is 200torr.

[0033] 4. The temperature is raised to 1170°C, and a layer of n-GaN doped with silane is grown with a thickness of 2.0um, and the growth pressure is 200torr.

[0034] 5. Switch the carrier gas, change from hydrogen to nitrogen, at a pressure of 200 torr, and grow AlxGa1-xN / InyGa1-yN multiple quantum well layers. The temperature is lowered to 1075°C to grow an InyGa1-yN quantum well layer with a thickness of 3nm; and the temperature is increased to 1165°C to grow an AlxGa1-xN quantum barrier layer with a thickness of 10nm to complete the growth of a pair of quantum wells. Then t...

Embodiment 2

[0038] Embodiment 2 (traditional scheme)

[0039] 1. Put the cleaned sapphire substrate into the MOCVD equipment and bake it at 1100°C for 10 minutes.

[0040] 2. Grow a low-temperature GaN layer with a thickness of 10nm at a temperature of 620°C and a growth pressure of 500torr.

[0041] 3. The temperature is raised to 1165°C to grow an undoped u-GaN layer with a thickness of 1.5um, and the growth pressure is 200torr.

[0042] 4. The temperature is raised to 1170°C, and a layer of n-GaN doped with silane is grown with a thickness of 2.0um, and the growth pressure is 200torr.

[0043] 5. Switch the carrier gas, change from hydrogen to nitrogen, at a pressure of 200 torr, and grow AlxGa1-xN / InyGa1-yN multiple quantum well layers. The temperature is lowered to 1075°C to grow an InyGa1-yN quantum well layer with a thickness of 3nm; and the temperature is increased to 1165°C to grow an AlxGa1-xN quantum barrier layer with a thickness of 10nm to complete the growth of a pair of quantum well...

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Abstract

The invention provides a novel LED epitaxial growth method which can effectively improve the lighting efficiency of LED epitaxial structures. The method comprises the links of N-GaN layer growth, multi-quantum well layer growth and P-GaN layer growth, wherein the multi-quantum well layer is of a structure of a plurality of pairs of AlxGa <1-x> N / InyGa <1-y> N, wherein x is more than 0 and less than 1, and y is more than 0 and less than 1; the multi-quantum well layer growth link includes three growth stages in sequence, wherein the AlxGa1-xN quantum barrier is subjected to p type doping in the first stage, the AlxGa1-xN quantum barrier is not doped in the second stage, and the AlxGa1-xN quantum barrier is subjected to n type doping in the third stage; a p type doped AlGaN stopping layer grows, and then the P-GaN layer growth link is performed.

Description

[0001] Technical field: [0002] The invention belongs to the preparation technology of semiconductor electronic devices, and particularly relates to a new method for growing LED epitaxial growth. [0003] Background technique: [0004] With its advantages of high luminous efficiency, long service life, strong safety and reliability, energy saving and environmental protection, LED lighting has become the third-generation high-efficiency light source after incandescent lamps and energy-saving lamps. At present, LED has been widely used in traffic lights, car tail lights, advertising display screens, mobile phone TV backlights and white light lighting. The production of a normal-use LED lamp bead generally goes through the following steps: epitaxial growth section, chip section and packaging section. The epitaxial growth section determines the brightness of the LED over 80%, which is the core technology of the entire industry chain. Epitaxial growth is the use of MOCVD technology to ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/30H01L33/26H01L33/00
CPCH01L33/005H01L33/04H01L33/32H01L2933/0008
Inventor 商毅博
Owner 西安利科光电科技有限公司
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