Method for preparing surface plasma resonance chip by taking silver as target

Abstract

The invention provides a method for preparing a surface plasma resonance chip by taking silver as a target. The method comprises the following steps: putting a glass substrate into a growth chamber of a vacuum sputtering instrument; introducing argon into the growth chamber, vacuumizing to 10<-3> to 10<-5>mbr, taking tungsten as a target, and sputtering a tungsten film on the glass substrate, wherein the base distance of the target is 5-8cm; and introducing argon into the growth chamber, vacuumizing to 10<-2> to 10<-4>mbr, taking silver as a target, and sputtering a silver film onto the product obtained in the previous steps, wherein the base distance of the target is 5-8cm. According to the method disclosed by the invention, the tungsten and silver are respectively taken as the targets, a vacuum sputtering principle is adopted, the target base distance of 5-8cm is adopted, the prepared metal film has the controllable thickness of about 65nm, and the film can be used for a surface plasma resonance chip.

Description

technical field [0001] The invention relates to the technical field of surface plasmon resonance sensing, in particular to a method for preparing a surface plasmon resonance chip by using silver as a target material. Background technique [0002] Surface plasmon resonance (SPR) is an advanced biochemical detection technology based on physical optics phenomena, which detects the binding process of various biomolecules by measuring the change in the refractive index of the chip surface caused by molecular binding. The change of the refractive index of the chip surface is related to the substances adsorbed on the metal surface, the ligand molecules are fixed on the metal film surface of the chip, and the binding process of the analyte and the ligand in the solution is monitored. During complex formation or dissociation, the refractive index of the solution on the surface of the chip changes, randomly generating SPR signals. [0003] The detection principle of surface plasmon r...

AI Technical Summary

Problems solved by technology

Since the effective depth of the evanescent wave is 100-200nm, the evanescent field cannot reach the metal / solution interface due to too thick metal film, and the reaction signal cannot be detected, which cannot reflect the changes on the surface of the metal film.