Flip-chip bonding electrode structure of surface-type semiconductor laser device
A laser device and electrode structure technology, which is applied in the direction of semiconductor lasers, semiconductor devices, laser components, etc., can solve the problems of increasing the distance between P-type electrodes and N-type electrodes, and the height difference between P-type electrodes and N-type electrodes. Effects of increased distance, prevention of short-circuit conditions, and simple packaging process
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[0024] Such as figure 1 As shown, the surface type semiconductor laser device flip chip electrode structure of the present invention includes: sapphire substrate (101), epitaxial growth layer (102), N' type electrode (103), P type electrode (104), N type electrode (105), gold wire (106) and insulating layer (107).
[0025] Described sapphire substrate (101) is the substrate that grows other structures as laser medium, and main component is aluminum oxide (Al 2 o 3 ); and the sapphire substrate (101) is a trigonal crystal system with a refractive index of 1.76-1.77, is a heterogeneous body, has no cleavage, and is developed by cleavage.
[0026] The epitaxial growth layer (102) is deposited and grown layer by layer on the sapphire substrate by metal organic compound chemical vapor deposition.
[0027] The N-type electrode (105) and the P-type electrode (104) are etched by photolithography to epitaxial growth layer, and then use evaporation or sputtering to cover one or more ...
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