Explosion-proof source bottle for diffusion furnace

A diffusion furnace and source bottle technology, which is applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as bottle bursting, and achieve the effect of improving service life, reducing the probability of bursting, and reducing equipment maintenance time and cycle.

Inactive Publication Date: 2015-03-11
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, POCl 3 It also has strong bonding performance, which will bond almost all plastic materials, and is more corrosive to metals, so the bottle bursting phenomenon of the source bottle made of this material frequently occurs

Method used

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  • Explosion-proof source bottle for diffusion furnace

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Embodiment Construction

[0021] The specific embodiment of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0022] In this example, see figure 1 , figure 1 It is a structural schematic diagram of an embodiment of an explosion-proof source bottle used in a diffusion furnace in the present invention. As shown in the figure, the explosion-proof source bottle of the present invention includes a source bottle 14, an air inlet pipeline 5 and an air outlet pipeline 8 connected to the source bottle 14, a pressure sensor 4 installed on the air inlet pipeline 5, and an air outlet pipeline 8 arranged in parallel. Several main parts such as pressure relief shunt 10. Wherein, the source bottle 14 is used to store the reaction source, such as POCl 3 . Usually, the source bottle 14 is placed in a constant temperature water tank to maintain a constant temperature (omitted in the figure). The upper bottle cap of the source bottle 14 is provided with ...

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Abstract

The invention discloses an explosion-proof source bottle for a diffusion furnace. The pressure in the explosion-proof source bottle can be detected to meet a set value or not timely by respectively installing a pressure sensor and a pressure relief branch on an air inlet pipeline and an air outlet pipeline of the explosion-proof source bottle, the opening of a decompression valve of the pressure relief branch can be controlled to depressurize timely by a pressure controller, therefore, the normal working pressure of a diffusion technique can be ensured, and the safety protection function can be realized.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing equipment, more specifically, to a source bottle with explosion-proof function for a diffusion furnace. Background technique [0002] Diffusion furnace is a kind of semiconductor process equipment, mainly used for doping process, especially in the production of crystalline silicon solar cells, diffusion furnace is the only doping equipment, which plays a decisive role in the formation of PN junction and the improvement of conversion efficiency in the manufacturing process. key equipment. [0003] Most of the current diffusion furnaces are used for phosphorus diffusion, and the quartz source bottle is used to store liquid POCl 3 , the N 2 Passed into the source bottle as a carrier gas, bubbled to carry POCl 3 Enter the process tube of the diffusion furnace, and produce phosphorus by fission at high temperature. In order to control N well 2 Carry POCl 3 The amount of the source bottl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/687H01L21/67253H01L21/67276
Inventor 桂晓波周蓉李补忠
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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