A kind of release film with silicon dioxide film layer and preparation method thereof

A technology of silicon dioxide film and release film, which is applied in coating, liquid chemical plating, metal material coating process, etc., and can solve problems such as difficult decomposition, high price, and secondary pollution

Active Publication Date: 2017-11-03
GUANGDONG SHENGYI SCI TECH
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In general, the release film is attached to the corresponding material for early protection. When the release film is torn off during use, the following disadvantages usually occur: the silicone release agent on the surface of the release film migrates into the contact material, causing contact The binding force between the surface of the material and other materials is reduced
[0004] In order to solve the problem of organosilicon release agent migration and contact materials, companies such as Dupont have introduced fluorine-containing release films (such as PTFE films). Although this film can solve this problem, the price is very expensive, and the used fluorine-containing film ( PTFE, etc.) bring secondary pollution to the environment, it is not easy to decompose, and cannot be recycled and reused
Most other release film manufacturers use silicone oil and other silicone release agents to coat the surface of PE and other films, which can also achieve routine effects, and the cost and price are relatively low, but serious quality problems often occur. That is, the silicone release agent falls off and remains on the surface of the insulating board, resulting in quality problems such as decreased adhesion of the insulating board during PCB processing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of release film with silicon dioxide film layer and preparation method thereof
  • A kind of release film with silicon dioxide film layer and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Embodiment 1 A kind of preparation method of the release film with silicon dioxide film layer, comprises the steps:

[0024] (1) Configure polysilazane solution: the concentration of polysilazane is 1%, and the solvent is organic solvent n-butyl ether;

[0025] (2) Coating of base film: coating the above-mentioned polysilazane solution on one side of the 25 micron PET film, driving off the solvent, and drying; then coating the above-mentioned polysilazane solution on the other side of the PET film, driving off the solvent, and drying Dry; polysilazane solution coating dry thickness range: 20 nanometers;

[0026] (3) The product obtained in step (2) is wet heat treated in an oven with a relative humidity of 85% and a temperature of 85°C for 2 hours, and then baked at a temperature of 120-150°C for 2 hours to obtain a double-sided film with a silicon dioxide film layer. Release film.

[0027] Performance Testing:

[0028] The double-sided release film with silicon diox...

Embodiment 2

[0029] Embodiment 2 A kind of preparation method of the release film with silicon dioxide film layer, comprises the steps:

[0030] (1) Configure polysilazane solution: the concentration of polysilazane is 5%, and the solvent is organic solvent n-butyl ether;

[0031] (2) Coating of the base film: coating the above-mentioned polysilazane solution on one side of the 50-micron PET film, driving off the solvent, and drying; then coating the above-mentioned polysilazane solution on the other side of the PET film, driving off the solvent, and drying Dry; polysilazane solution coating dry thickness range: 100 nm;

[0032] (3) The product obtained in step (2) is wet heat treated in an oven with a relative humidity of 85% and a temperature of 85°C for 3 hours, and then baked at a temperature of 120-150°C for 2 hours to obtain a double-sided film with a silicon dioxide film layer. Release film.

[0033] Performance Testing:

[0034] Laminate the double-sided release film with a sili...

Embodiment 3

[0035] Embodiment 3 A kind of preparation method of the release film with silicon dioxide film layer, comprises the steps:

[0036] (1) Configure polysilazane solution: the polysilazane concentration is 10%, and the solvent is organic solvent n-butyl ether;

[0037] (2) Coating of base film: coating the above-mentioned polysilazane solution on one side of the 25 micron PET film, driving off the solvent, and drying; then coating the above-mentioned polysilazane solution on the other side of the PET film, driving off the solvent, and drying Dry; polysilazane solution coating dry thickness range: 200 nm;

[0038] (3) The product obtained in step (2) is wet heat treated in an oven with a relative humidity of 85% and a temperature of 85°C for 3 hours, and then baked at a temperature of 120-150°C for 2 hours to obtain a double-sided film with a silicon dioxide film layer. Release film.

[0039] Performance Testing:

[0040] Laminate the double-sided release film with a silicon di...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
peel strengthaaaaaaaaaa
Login to view more

Abstract

The invention provides a release film with a silicon dioxide coating and a preparation method of the release film. The preparation method comprises the following steps: (1) preparing a polysilazane solution; (2) coating one surface or two surfaces of a PET film with the polysilazane solution, expelling a solvent, and drying, wherein the drying thickness of a polysilazane coating is 20-200nm; an (3) carrying out heat-moisture treatment on the product obtained from the step (2) in a drying oven of which the relative humidity is 85% and the temperature is 85 DEG C for 2-3 hours, and drying at 120-150 DEG C for 1-2 hours, so as to obtain the release film with the silicon dioxide coating. The silicon dioxide (SiO2) film is compact in structure, smooth in surface, and small in binding force with epoxy resin and the like, and thus the release effect can be achieved. In addition, the silicon dioxide (SiO2) film is generated by reaction of the polysilazane solution; the binding force of an inner layer and the film is good; a smooth compact layer is formed on the outer layer, and is weak in binding force with common epoxy; meanwhile, the problems of coating leakage and the like can be solved in the solution coating process, and thus the overall release effect can be achieved.

Description

technical field [0001] The invention relates to the technical field of release films, in particular to a release film with a silicon dioxide film layer and a preparation method thereof. Background technique [0002] The release film refers to a film with a separable surface. The release film is not sticky or slightly sticky after being in contact with a specific material under limited conditions. Usually, in order to increase the release force of the plastic film, the plastic film will be treated with plasma, or coated with fluorine, or coated with silicone (silicone) release agent on the surface of the film material, such as PET, PE, OPP, etc. etc.; it can show extremely light and stable release force for various organic pressure-sensitive adhesives, such as hot-melt adhesives, acrylic adhesives and rubber-based pressure-sensitive adhesives. According to the required release force of the release film, the viscosity of the isolation product adhesive is different, and the re...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/12
CPCC23C18/1208C23C18/125
Inventor 刘东亮
Owner GUANGDONG SHENGYI SCI TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products