A radio frequency glow discharge ionization device

A technology of radio frequency glow discharge and radio frequency, which is applied in the field of mass spectrometry analysis and detection, can solve the problems of low detection accuracy and achieve the effects of wide detection application range, low detection limit and high ion introduction efficiency

Inactive Publication Date: 2016-11-30
SOUTH CHINA NORMAL UNIVERSITY
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For the detection of semiconductor and non-conductive materials, DC glow discharge ionization needs to introduce a conductive matrix, and the detection accuracy is not high

Method used

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  • A radio frequency glow discharge ionization device
  • A radio frequency glow discharge ionization device
  • A radio frequency glow discharge ionization device

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Embodiment Construction

[0020] refer to Figure 1 to Figure 3 , the present invention provides a radio frequency glow discharge ionization device, comprising a closed ionization chamber 21, a mass spectrometer 36 and a device main body located in the ionization chamber 21, the device main body includes a copper block with a copper block 3 The fixed seat 9 and the sample fixed seat 10 equipped with the sample 4, the copper block 3 is connected to the ground potential with the ionization chamber bottom plate 24 through a wire, and the DC self-bias voltage conducting with the external circuit 28 is provided on the said ionization chamber bottom plate 24 Connecting port 29, DC bias voltage The connecting port 29 connects the DC bias voltage generated by the radio frequency discharge to the external circuit 28, and adjusts the radio frequency discharge by adjusting the external circuit 28 to change the DC bias voltage. The sample 4 is connected to the radio frequency power supply 26 through the radio freq...

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Abstract

The invention discloses a radio-frequency glow discharge ionization device comprising a closed ionization chamber, a mass spectrometer and a device main body located in the ionization chamber. The device main body comprises a copper block fixing seat which contains a copper block and a sample fixing seat which contains a sample, the copper block is connected to an external circuit through a direct current automatic biasing voltage interface on the ionization chamber, and the sample is connected to a radio-frequency power source through a radio-frequency signal importing interface. The copper block fixing seat and the sample fixing seat are arranged in an opposite mode between the copper block and the sample to form an ionization area. A repulsion board which puts plasma in the ionization area into the mass spectrometer is arranged on one side of the ionization area, and the repulsion board is connected to a high direct voltage power source through a repulsion voltage importing interface on the ionization chamber. The radio-frequency glow discharge ionization device cannot be limited by the material of conductor or semiconductor or nonconductor, has the advantages of high in ionization efficiency and ionization importing efficiency, and is characterized by wide detection applying range, high sensitivity and low detection limit.

Description

technical field [0001] The invention is used in the field of mass spectrometry analysis and detection, and in particular relates to a radio frequency glow discharge ionization device. Background technique [0002] As an important optoelectronic material, high-purity materials are widely used in aerospace, microelectronics, information, infrared, solar energy and other industrial fields. For example: high-purity copper can be directly used as an additive element in the development of superalloys in aviation and space atom industries, and in the analysis of standard samples. It is the main material for preparing high-quality audio cables, liquid crystal display sputtering targets, and ion coatings. High-purity titanium is an important material for manufacturing aircraft, rockets, spacecraft, ships, telecommunications equipment and artificial bones. 6N (99.9999%) grade silicon is the main material for manufacturing solar cells, while the purity of semiconductor-grade polysilic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J49/26H01J49/10
CPCH01J49/105H01J49/26
Inventor 郭长娟朱辉张景堂李艳杨捷万家海黄正旭
Owner SOUTH CHINA NORMAL UNIVERSITY
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