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Low resistivity niobium-doped niobium oxide sputtering rotation target material and preparation method thereof

A low-resistivity, niobium oxide technology, applied in the direction of sputtering plating, metal material coating process, ion implantation plating, etc., can solve the problems of low transmittance and high resistivity, and achieve high transmittance, High density, progress-driven effect

Active Publication Date: 2015-08-12
WUHU YINGRI TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] With the rapid development of social economy, electronic products have become an indispensable tool and necessity in our life. A very key component in electronic products is touch screen and optical glass. The coating is achieved by magnetron sputtering coating process. The material to realize this process is a rotating target. At present, the market demand for rotating targets in China and the Asia-Pacific region exceeds 70% of the world's total demand. The market prospect is broad. For the touch screen industry and optical coating industry, magnetron sputtering The film has two extremely important index parameters, which are transmittance and resistivity. Whether the magnetron sputtering coating index parameters can be achieved depends on the quality of the rotating target, and the quality of the rotating target is determined by its production process and raw materials. The powder formula is determined. In the final analysis, the root problem is the formula and production process of the rotating target. As far as the current situation is concerned, the formula is 99.9% of niobium oxide content, and the rest is impurities. The production process is relatively simple. This formula and The products obtained by the process can meet certain requirements for use, but there are also obvious defects, such as high resistivity and low transmittance, which will seriously affect the rapid development of the electronics industry. In order to solve this problem, the most direct method is Using new formula and new technology to reduce resistivity and improve transmittance

Method used

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  • Low resistivity niobium-doped niobium oxide sputtering rotation target material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Example 1: Preparation of niobium oxide doped niobium sputtering rotating target

[0031] Table 1 Constituent dosage and parameter list of each embodiment

[0032]

[0033] The ingredients used are listed in Table 1.

[0034] Preparation of stainless steel back pipe: 1.1) Cutting: Use a sawing machine to take a 304 stainless steel pipe with a length of 1520mm. The inner diameter of the steel pipe is 125mm and the outer diameter is 133mm; Groove, bevel, etc.; 1.3) surface roughening: take out the stainless steel tube obtained in step 1.2, and use a sandblasting machine to sandblast its surface. The sandblasting material is brown corundum with a particle size of 80 mesh, and the sandblasting time is 1h; 1.4 ) Primer: Take out the roughened stainless steel pipe in step 1.3, and spray a layer of CuAl material layer on its surface by an arc spraying machine, the coating thickness is 0.5mm, 2. The preparation of niobium oxide coating includes the following four steps: 2.1...

Embodiment 2

[0038] Example 2: Preparation of niobium oxide doped niobium sputtering rotating target

[0039] The ingredients are shown in Table 1.

[0040] The preparation method is the same as in Example 1, and the parameters are shown in Table 1.

[0041] The relative density and resistivity detected by the Archimedes method are shown in Table 1.

[0042] It shows that under the same spraying process parameters, the content of niobium is slightly higher, the relative density is higher, and the resistivity is smaller.

Embodiment 3

[0043] Example 3: Preparation of niobium oxide doped niobium sputtering rotating target

[0044] The ingredients are shown in Table 1.

[0045] The preparation method is the same as in Example 1, and the parameters are shown in Table 1.

[0046] The relative density and resistivity detected by the Archimedes method are shown in Table 1.

[0047] It shows that when the proportion of the finished product is the same and the main gas does not reach a certain amount, simply increasing the current intensity cannot increase the density of the target and reduce the resistivity.

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Abstract

The invention discloses a low resistivity niobium-doped niobium oxide sputtering rotation target material and a preparation method thereof. The target material comprises 97.5-99.5wt% of NbOx, 0.4-2.4wt% of Nb, and the balance of impurities, wherein x is greater than 0.05 and lower than 2.5, and preferably greater than 2 and lower than 2.5. The preparation method comprises the following steps: producing a stainless steel back tube; and mixing powders, drying, carrying out vacuum plasma spraying, and machining. The target material obtained by adopting the above formula and introducing a new production technology has the advantages of low resistivity, high transmittance and greatly improved performances. The transmittance is mainly related with the thickness and the composition structure of a film designed by a downstream film plating manufacturer, and the transmittance of the thickness with same thickness in the film plating process is high if the compactness of the target material is high. The target material can be widely used in fields of touch screens, optical glass plating films, TFT and the like, and greatly promotes the process of the industry.

Description

technical field [0001] The invention relates to the field of touch screen / optical glass magnetron sputtering coating, in particular to a low-resistivity niobium oxide-doped niobium sputtering rotary target and a preparation method thereof. Background technique [0002] With the rapid development of social economy, electronic products have become an indispensable tool and necessity in our life. A very key component in electronic products is touch screen and optical glass. The coating is achieved by magnetron sputtering coating process. The material to realize this process is a rotating target. At present, the market demand for rotating targets in China and the Asia-Pacific region exceeds 70% of the world's total demand. The market prospect is broad. For the touch screen industry and optical coating industry, magnetron sputtering The film has two extremely important index parameters, which are transmittance and resistivity. Whether the magnetron sputtering coating index parame...

Claims

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Application Information

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IPC IPC(8): C23C14/34C22C29/12C23C4/06C23C4/12
Inventor 罗永春曾墩风张斐王志强
Owner WUHU YINGRI TECH CO LTD
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