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Gallium nitride base low leakage current fixed-beam switch field effect transistor mixer

A field-effect transistor and gallium nitride-based technology, applied in the field of micro-electromechanical systems, can solve problems such as chip overheating, chip life reduction, and affecting chip stability, and achieve the effects of reduced power consumption, high switching frequency, and small size

Active Publication Date: 2015-09-23
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As the number of transistors in the chip is increasing, the power consumption of the integrated circuit will follow. Excessive power consumption will cause the chip to overheat, and the operating characteristics of the transistor will be affected by the temperature. Change, so overheating The chip temperature will not only reduce the life of the chip, but also affect the stability of the chip

Method used

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  • Gallium nitride base low leakage current fixed-beam switch field effect transistor mixer
  • Gallium nitride base low leakage current fixed-beam switch field effect transistor mixer
  • Gallium nitride base low leakage current fixed-beam switch field effect transistor mixer

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Embodiment Construction

[0017] The GaN-based low leakage current solid-supported beam switch MESFET mixer of the present invention is fabricated on a gallium nitride substrate 1, and consists of three N-type MESFETs with solid-supported beam switches, that is, the first fixed-supported beam-gate N-type MESFET 2, the second fixed beam grid N-type MESFET 3, the first fixed beam grid N-type MESFET 2, the second fixed beam grid N-type MESFET 3, the third fixed beam grid N-type MESFET 4, the first fixed beam grid N-type MESFET A layer of silicon nitride 12 is formed on the gate of the beam grid N-type MESFET 2, the second fixed beam grid N-type MESFET 3, and the third fixed beam grid N-type MESFET 4. The MESFET consists of a gate 7, a source and drain, wherein the source and drain are composed of metal and heavily doped N region to form an ohmic contact, the gate is composed of metal and a channel region to form a Schottky contact, the lead 5 is made of Al, and the MESFET gate 7 A MEMS fixed beam switch 6...

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Abstract

The invention aims to provide a gallium nitride base low leakage current fixed-beam switch field effect transistor mixer. Three metal semiconductor field-effect transistors (MESFET) with a micro-electromechanical system (MEMS) fixed-beam switch structure replace a conventional MESFET, so that gate electrode leakage current of the transistor in the mixer is reduced, and the power consumption of the circuit is lowered. The mixer has a small volume and is easy to integrated, is made of the gallium nitride material with high electronic mobility, and can realize very high switch frequency. Another innovation of the mixer is a second working mode of the mixer. If a direct current voltage V is only loaded on the gate electrode of the third fixed-beam gate N type MESFET (4) below a differential pair, and the third fixed-beam gate N type MESFET (4) is in a breakover state, the third fixed-beam gate N type MESFET (4) can be considered as a constant current source, and the mixer also can be used as a differential amplifier. Due to the design, the mixer can realize two different functions by use of the same quantity of transistors.

Description

technical field [0001] The invention provides a gallium nitride-based low-leakage current solid-supported beam switch MESFET mixer, which belongs to the technical field of micro-electromechanical systems. Background technique [0002] With the development of wireless communication technology, the wave of rapid update of mobile terminal equipment has hit the world, and various advanced technologies have been invented and applied to the manufacture of mobile terminal equipment. At the same time, as an indispensable and important part of such equipment, radio frequency integrated circuit (RFIC) chips are also developing rapidly, the scale of integration continues to expand, and the operating frequency continues to increase. Traditional silicon-based materials can no longer meet the requirements. MESFET based on gallium nitride substrate is proposed and applied under this background. Due to the good characteristics of gallium nitride material, the transistor manufactured by it h...

Claims

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Application Information

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IPC IPC(8): H03D7/16
Inventor 廖小平陈子龙
Owner SOUTHEAST UNIV
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