Gallium nitride base low leakage current fixed-beam switch field effect transistor mixer
A field-effect transistor and gallium nitride-based technology, applied in the field of micro-electromechanical systems, can solve problems such as chip overheating, chip life reduction, and affecting chip stability, and achieve the effects of reduced power consumption, high switching frequency, and small size
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[0017] The GaN-based low leakage current solid-supported beam switch MESFET mixer of the present invention is fabricated on a gallium nitride substrate 1, and consists of three N-type MESFETs with solid-supported beam switches, that is, the first fixed-supported beam-gate N-type MESFET 2, the second fixed beam grid N-type MESFET 3, the first fixed beam grid N-type MESFET 2, the second fixed beam grid N-type MESFET 3, the third fixed beam grid N-type MESFET 4, the first fixed beam grid N-type MESFET A layer of silicon nitride 12 is formed on the gate of the beam grid N-type MESFET 2, the second fixed beam grid N-type MESFET 3, and the third fixed beam grid N-type MESFET 4. The MESFET consists of a gate 7, a source and drain, wherein the source and drain are composed of metal and heavily doped N region to form an ohmic contact, the gate is composed of metal and a channel region to form a Schottky contact, the lead 5 is made of Al, and the MESFET gate 7 A MEMS fixed beam switch 6...
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