Device and method for obtaining high-purity helium gas through concentration and purification

A helium, high-purity technology, applied in the direction of chemical instruments and methods, inorganic chemistry, inert gas compounds, etc., can solve the problems of short life cycle, unsatisfactory, large amount of adsorbent, etc., and achieve the effect of recycling

Active Publication Date: 2015-09-30
江苏正帆半导体设备有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the helium enrichment recovery method on the market is mainly the pressure swing adsorption method, but the pressure swing adsorption method has the following disadvantages: the one-time investment is huge, and the land occupation requirement is large; multi-stage purification is required, so the system is complicated and the yield is low; adsorption The amount of agent used is large, there are many types, and the life cycle is short; moreover, pressure swing adsorption cannot enrich the helium to a concentration above 99.999%, which cannot meet the needs of many semiconductor factories and optical fiber factories.

Method used

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  • Device and method for obtaining high-purity helium gas through concentration and purification

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Effect test

Embodiment 1

[0036] Such as figure 1 Shown is a schematic diagram of the device structure for enriching and purifying high-purity helium. The device for enriching and purifying high-purity helium comprises a dry dechlorination device 1, a buffer tank 2, a compressor 3, a filter 4, a dryer 5, a drying tower 6, a liquid argon tank 8, a solid Argon tank 9 , adsorption tank 10 and gas storage tank 11 , wherein the liquid argon tank 8 , solid argon tank 9 and adsorption tank 10 are immersed in the liquid nitrogen in the liquid nitrogen Dewar tank 7 . The dry chlorine removal device 1 is an adsorption column with sodium hydroxide as a chemical adsorption filler. The liquid argon tank 8 and the solid argon tank 9 are provided with discharge valves. The liquid argon tank 8, the solid argon tank 9 and the adsorption tank 10 can be recycled. The inlet and outlet of the compressor 3 are equipped with pressure sensors, which are used to stop the compressor when the inlet is low pressure and the out...

Embodiment 2

[0048] Such as figure 1 Shown is a schematic diagram of the device structure for enriching and purifying high-purity helium. The device for enriching and purifying high-purity helium comprises a dry dechlorination device 1, a buffer tank 2, a compressor 3, a filter 4, a dryer 5, a drying tower 6, a liquid argon tank 8, a solid Argon tank 9 , adsorption tank 10 and gas storage tank 11 , wherein the liquid argon tank 8 , solid argon tank 9 and adsorption tank 10 are immersed in the liquid nitrogen in the liquid nitrogen Dewar tank 7 . The dry chlorine removal device 1 is an adsorption column with chemical adsorption filler potassium hydroxide inside. The liquid argon tank 8 and the solid argon tank 9 are provided with discharge valves. The liquid argon tank 8, the solid argon tank 9 and the adsorption tank 10 can be recycled. The inlet and outlet of the compressor 3 are equipped with pressure sensors, which are used to stop the compressor when the inlet is low pressure and th...

Embodiment 3

[0060] Such as figure 1 Shown is a schematic diagram of the device structure for enriching and purifying high-purity helium. The device for enriching and purifying high-purity helium comprises a dry dechlorination device 1, a buffer tank 2, a compressor 3, a filter 4, a dryer 5, a drying tower 6, a liquid argon tank 8, a solid Argon tank 9 , adsorption tank 10 and gas storage tank 11 , wherein the liquid argon tank 8 , solid argon tank 9 and adsorption tank 10 are immersed in the liquid nitrogen in the liquid nitrogen Dewar tank 7 . The dry chlorine removal device 1 is an adsorption column with sodium hydroxide as a chemical adsorption filler. The liquid argon tank 8 and the solid argon tank 9 are provided with discharge valves. The liquid argon tank 8, the solid argon tank 9 and the adsorption tank 10 can be recycled. The inlet and outlet of the compressor 3 are equipped with pressure sensors, which are used to stop the compressor when the inlet is low pressure and the out...

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Abstract

The invention provides a device and method for obtaining high-purity helium gas through concentration and purification. The device for obtaining high-purity helium gas through concentration and purification is characterized by comprising a dechlorination device, a buffer tank, a compressor, a filter, a drying machine, a drying tower, a liquid argon tank, a solid argon tank, an adsorption tank and a gas storage tank which are connected in sequence. According to the device and method for obtaining high-purity helium gas through concentration and purification, provided by the invention, the helium gas can be purified to achieve a concentration of 99.999% or above, the recovery rate of helium gas can reach 95% or above, the recovered helium gas can be resupplied to the user side for continual use, and the cycle use of helium gas is realized.

Description

technical field [0001] The invention relates to a method for enriching and purifying high-purity helium, and belongs to the related technical fields of gas recovery, circular economy and the like. Background technique [0002] Helium is an inert gas, which belongs to small atomic substances, has good diffusivity and thermal properties, and its content in the air is extremely small, accounting for 5.26x10 of the volume -6 , helium is an accompanying product of oil and gas, but the helium content in China's oil and gas fields is very low, less than 0.1%. China is a helium-poor country. my country's industrial helium mainly relies on imports. Helium is a precious resource. It is expected to be exhausted after 25-30 years. [0003] my country's industrial helium is mainly imported from the United States. At present, the supply of helium resources has been tight, and the price of helium has been rising. When the supply is the most tense, the phenomenon of price and no stock often...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B23/00
Inventor 汤剑波龚小雷周庆美王志高李东升
Owner 江苏正帆半导体设备有限公司
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