Method for one-step pulsed laser deposition of multilayer magneto-optical thin films
A technology of pulsed laser deposition and pulsed laser, which is applied in the direction of chemical instruments and methods, coatings, polycrystalline material growth, etc., can solve the problems of thin film crack preparation time, etc., and achieve the effect of improving quality and improving efficiency
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specific Embodiment approach 1
[0028] Embodiment 1: The method for one-step pulsed laser deposition of multilayer magneto-optical thin films described in this embodiment, the method includes the following steps:
[0029] Step 1. Put the semiconductor substrate into the vacuum chamber, and wait for the vacuum degree in the vacuum chamber to reach 5×10 under the condition of temperature ranging from room temperature to 700°C -5 Torr-1×10 -6 After Torr, fill the vacuum cavity with gas, and keep the gas flow at 5mTorr-25mTorr;
[0030] Step 2. Using the pulsed laser deposition method to continuously deposit two or three layers of iron garnet magneto-optical films in one step, the energy density of the pulsed laser is 1.5J / cm 2 -2.5J / cm 2 , the frequency of the pulsed laser is 1Hz-20Hz;
[0031] Step 3: performing rapid annealing on the thin film deposited in step 2 under an oxygen atmosphere below 800° C., and the duration of the annealing process is 3 minutes to 5 minutes.
specific Embodiment approach 2
[0032] Specific embodiment 2: This embodiment is to further explain the method for one-step pulse laser deposition of multilayer magneto-optical thin films described in specific embodiment 1. In this embodiment, the gas charged into the vacuum chamber is argon, nitrogen or oxygen.
specific Embodiment approach 3
[0033] Embodiment 3: This embodiment is a further description of the method for one-step pulse laser deposition of magneto-optical thin films described in Embodiment 1. In this embodiment, the duration of the annealing process in step 3 is 5 minutes.
[0034] Specific implementation mode four: combination Figure 1 to Figure 4 Describe this embodiment in detail. This embodiment is a further description of the method for one-step pulse laser deposition of a multilayer magneto-optical thin film as described in Embodiment 1. In this embodiment, the material of the deposited iron garnet magneto-optic film is YIG , CeYIG, BIG, or CeBIG.
[0035] figure 1 YIG is the deposited first layer of iron garnet magneto-optical film, and CeYIG, BIG or CeBIG is the deposited second layer of iron garnet magneto-optic film; figure 2 CeYIG, BIG or CeBIG is the deposited first layer of iron garnet magneto-optical film, and YIG is the deposited second layer of iron garnet magneto-optic film; i...
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