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Method for preparing nano TiO2 array on porous silicon substrate by adopting hydrothermal method

A technology of porous silicon and hydrothermal method, which is applied in the fields of nanotechnology, nanotechnology, and nanotechnology for materials and surface science, and achieves the effect of broad application prospects, excellent lattice unity, and simple preparation.

Inactive Publication Date: 2015-11-11
DONGHUA UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although there have been reports on the preparation of single-crystal titania arrays by hydrothermal method, it is still a challenge to prepare and control one-dimensional titania nano-single-crystal arrays for photodetection on porous silicon substrates.

Method used

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  • Method for preparing nano TiO2 array on porous silicon substrate by adopting hydrothermal method
  • Method for preparing nano TiO2 array on porous silicon substrate by adopting hydrothermal method
  • Method for preparing nano TiO2 array on porous silicon substrate by adopting hydrothermal method

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Embodiment 1

[0032] A preparation of nano-TiO on porous silicon substrates by hydrothermal method 2 Array method, the specific steps are:

[0033] (1) Soak the porous silicon substrate in dilute hydrofluoric acid with a mass fraction of 6% for 10 minutes, wash it with deionized water, and then dry it in an inert gas;

[0034] (2) Coating a thin layer of titanium oxide on the above-mentioned porous silicon substrate by magnetron sputtering, the target material is a metal titanium target, the volume flow ratio of the reaction gas argon and oxygen is 3:1, the DC sputtering power is 30W, and the sputtering Shooting time 10 minutes;

[0035] (3) Put the above-mentioned porous silicon substrate coated with titanium oxide film into a muffle furnace, and calcinate at 450° C. for 2 hours;

[0036] (4) 0.4ml n-tetrabutyl titanate (C 16 h 36 o 4 Ti) stirring and dropping in 20ml of 19% hydrochloric acid solution with a mass fraction of 0.05ml / s to obtain a mixed solution;

[0037] (5) Put the a...

Embodiment 2

[0040] A preparation of nano-TiO on porous silicon substrates by hydrothermal method 2 Array method, the specific steps are:

[0041] (1) Soak the porous silicon substrate in dilute hydrofluoric acid with a mass fraction of 6% for 10 minutes, wash with deionized water, and dry in an inert gas;

[0042] (2) Coating a thin layer of titanium oxide on the above-mentioned porous silicon substrate by magnetron sputtering, the target material is a titanium oxide ceramic target, the reaction gas is argon, the radio frequency sputtering power is 30W, and the sputtering time is 10 minutes;

[0043] (3) Put the above-mentioned porous silicon substrate coated with titanium oxide film into a muffle furnace, and calcinate at 450° C. for 2 hours;

[0044] (4) 0.4ml n-tetrabutyl titanate (C 16 h 36 o 4 Ti) Stirring and dropping in 20ml of hydrochloric acid solution with a mass fraction of 19%, the dropping speed is 0.05ml / s to obtain a mixed solution;

[0045](5) Put the above-mentioned ...

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Abstract

The invention provides a method for preparing a nano TiO2 array on a porous silicon substrate by adopting a hydrothermal method. The method is characterized by comprising the following steps: placing a porous silicon substrate in hydrofluoric acid for soaking, cleaning, drying in inert gas for standby application; plating the porous silicon substrate with a layer of titanium oxide by utilizing magnetron sputtering; placing the porous silicon substrate plated with a titanium oxide film in a muffle furnace for calcining; dropwise adding tetra-n-butyl titanate in a hydrochloric acid solution under the stirring condition to obtain a mixed solution; placing the mixed solution and the porous silicon substrate plated with the titanium oxide film in a polytetrafluoroethylene hydrothermal reaction kettle, placing the hydrothermal reaction kettle in an air dry oven for reaction under the hydrothermal condition, cooling to room temperature, cleaning, and drying to obtain the nano TiO2 array on the porous silicon substrate. According to the method for preparing nano TiO2 array on the porous silicon substrate by adopting the hydrothermal method, provided by the invention, the prepared silica-based nanometer titania array is composed of nanorods growing from bottom to top, so that the array has an excellent crystal lattice singularity and ultraviolet light and visible light spectral response.

Description

technical field [0001] The invention belongs to silicon-based nano TiO 2 The field of preparation of arrays, especially related to the preparation of nano-TiO on porous silicon substrates by hydrothermal method 2 array method. Background technique [0002] In recent years, various multi-band photodetectors have attracted more and more research interest from scientists because of their wide applications in imaging, medical treatment, astronomical observation, and military applications. Combining different semiconductor materials has become an effective method to obtain multi-band detection. Among them, detectors based on silicon are often used to detect visible light, while detectors based on metal oxides and nitrides are often used to detect ultraviolet light. The growth of metal oxide nanomaterials on silicon substrates is very direct in the field of multi-band detection. application prospects. [0003] Titanium dioxide is a wide bandgap semiconductor that can have two ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G23/053B82Y30/00
Inventor 胡俊青季涛刘倩邹儒佳曹云玖刘锡建安磊徐开兵
Owner DONGHUA UNIV
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