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Chlorosilane-containing waste gas recovery treatment apparatus

A technology for recycling and processing chlorosilanes, which is applied in the direction of halosilanes, silicon halide compounds, lighting and heating equipment, etc., can solve the problems of non-recyclable, corrosive, and large amount of eluent, and improve the recycling rate , reduce processing costs, and realize the effect of recycling

Active Publication Date: 2015-11-25
XINTE ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

However, the waste liquid formed after leaching has a very high water content and is corrosive, which makes the transportation facilities easily damaged by corrosion, and the waste residue in the waste liquid is also easy to block the transportation pipeline, and the process of waste liquid transportation and manual slag removal is harmful to the surrounding environment. more serious pollution
In addition, the eluent (such as pure water or lye) used in the leaching process cannot be recycled, resulting in a huge amount of eluent, which increases the amount of waste liquid and the cost of treatment.

Method used

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  • Chlorosilane-containing waste gas recovery treatment apparatus
  • Chlorosilane-containing waste gas recovery treatment apparatus

Examples

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Embodiment 1

[0030] Such as figure 1 As shown, this embodiment provides a recovery and treatment device for chlorosilane-containing waste gas, including: a chlorosilane recovery unit, a chlorosilane washing unit and a tail gas venting unit.

[0031] Wherein, the chlorosilane waste gas includes nitrogen, hydrogen, hydrogen chloride gas, chlorosilane gas and impurities such as B and P, and the impurities such as B and P include: PCl 3 (phosphorus trichloride), PCl 5 (phosphorus pentachloride), BCl 5 (boron pentachloride) and PH 3(phosphine), and chlorides of B (boron), P (phosphorus); chlorosilane (chlorosilane) is silane (SiH 4 ) in which hydrogen atoms are replaced by chlorine atoms, which is a gas when the chlorine content is low, and a liquid when the chlorine content is high, and the general formula is SiH n Cl 4-n , n=0,1,2,3.

[0032] The chlorosilane recovery unit is connected with the chlorosilane washing unit, and is used for recovering part of the chlorosilane gas in the chl...

Embodiment 2

[0055] Such as figure 2 As shown, this embodiment provides a recycling and processing device for chlorosilane-containing waste gas, including: a frozen brine precooler 2, a booster 6, an absorption tower 8, a circulation pump 11, a deep cooler 12, a resin adsorption column 15, Mixing subunit 18, rinsing tower 19, stirring subunit 20, spray head 21, booster pump 24, water seal tank 28.

[0056] The working principle of the recovery treatment device is:

[0057] After the chlorosilane waste gas 1 enters the frozen brine precooler 2, part of the chlorosilane gas forms a chlorosilane condensate 3, and is delivered to the recovery system 4, while the remaining chlorosilane waste gas 5 (i.e. not described in Example 1) The chlorine-containing silane exhaust gas that forms condensate) enters the booster 6, and after being pressurized by the booster 6 to 0.05MPaG-0.2MPaG, it becomes a high-pressure exhaust gas 7. After the high-pressure exhaust gas 7 enters the absorption tower 8, i...

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Abstract

The present invention provides a chlorosilane-containing waste gas recovery treatment apparatus, which comprises a chlorosilane recovery unit, a chlorosilane leaching unit and a tail gas emptying unit, wherein the chlorosilane recovery unit is connected with the chlorosilane leaching unit and is used for recovering partial chlorosilane gas in chlorosilane-containing waste gas and conveying the remaining waste gas to the chlorosilane leaching unit, the chlorosilane leaching unit is connected with the tail gas emptying unit and is used for leaching out the remaining chlorosilane gas and hydrogen chloride gas in the remaining waste gas so as to clear the chlorosilane gas and the hydrogen chloride gas in the remaining waste gas, and conveying the chlorosilane gas and hydrogen chloride gas-clearing remaining waste gas to the tail gas emptying unit, and the tail gas emptying unit is used for emptying the chlorosilane gas and hydrogen chloride gas-clearing remaining waste gas. With the recovery treatment apparatus of the present invention, the chlorosilane resource in the recovered waste gas can be completely recovered, and the pollution-free treatment can be performed on the chlorosilane incapable of being recovered in the waste gas.

Description

technical field [0001] The invention relates to the technical field of waste treatment, in particular to a recovery and treatment device for chlorosilane waste gas. Background technique [0002] In the polysilicon production process, due to production needs, each process unit (such as purification unit, reduction tail gas dry recovery unit, cold hydrogenation unit, reduction unit, tank farm, etc.) will inevitably emit a certain amount of tail gas (also known as exhaust gas). With the continuous expansion of the production scale of polysilicon, the emission of tail gas (mainly composed of nitrogen, hydrogen chloride, chlorosilane and hydrogen) will also increase sharply. On the one hand, a large amount of chlorosilane resources in the tail gas will be wasted; If it is leaked, it will cause serious pollution to the environment. Therefore, it is necessary to treat the tail gas formed in the polysilicon production process and then discharge it normally. [0003] At present, th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107F25J3/00B01D53/18
Inventor 张旭
Owner XINTE ENERGY
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