Packaging structure and packaging method
A technology of packaging structure and packaging method, which is applied in the direction of semiconductor/solid-state device parts, semiconductor devices, electrical components, etc., can solve the problems of lead bending fatigue, fracture and debonding, inconsistent tail wires, etc., to improve stability and improve Effects of efficiency, small package height
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no. 1 example
[0045] figure 1 A schematic structural diagram of the packaging structure of the first embodiment of the present invention is shown. The package structure 10 includes: a package substrate 210, a die 110, an adhesive layer 211, a first encapsulation body 311, a second encapsulation body 312, an interconnection structure, and a rewiring structure.
[0046] The packaging substrate 210 may include semiconductor materials (such as silicon, germanium, indium antimonide, gallium arsenide, indium arsenide, gallium nitride, etc.), insulating materials (epoxy resin, polyester glass, silicon dioxide, polytetrafluoroethylene, etc.) , Glass, ceramics, etc.) or a combination thereof. The packaging substrate 210 includes opposite first and second surfaces.
[0047] The die 110 includes opposite active and back surfaces. The device layer of the die 110 is located on the active side, and the device layer includes transistors and other devices such as resistors, capacitors, and inductors. Above t...
no. 2 example
[0055] figure 2 The structure diagram of the package structure of the second embodiment of the present invention is shown. The package structure 20 includes: a package substrate 220, a die 120, an adhesive layer 221, a first encapsulation body 321, an interconnection structure, a second encapsulation body 322, and a rewiring structure. The interconnection structure includes a patterned metal layer 421 and a metal layer 422; the rewiring structure includes a metal layer 522 and a solderable layer 521.
[0056] The packaging substrate 220 may include semiconductor materials (such as silicon, germanium, indium antimonide, gallium arsenide, indium arsenide, gallium nitride, etc.), insulating materials (epoxy, polyester glass, silicon dioxide, polytetrafluoroethylene, etc.) , Glass, ceramics, etc.) or a combination thereof. The packaging substrate 220 includes opposite first and second surfaces.
[0057] The die 120 includes opposing active and back surfaces. The device layer of the...
no. 3 example
[0065] image 3 A structural diagram of the package structure of the third embodiment of the present invention is shown. The packaging structure 30 includes a packaging substrate 230, a die 130, an adhesive layer 231, a back metal layer 535, a first encapsulation body 331, an interconnection structure, a second encapsulation body 332, a through channel, and a redistribution structure. The interconnection structure includes a patterned metal layer 431 and a metal layer 432; the rewiring structure includes a patterned metal layer 531, a metal layer 532, a metal layer 533, and a solderable layer 534.
[0066] The packaging substrate 230 may include semiconductor materials (such as silicon, germanium, indium antimonide, gallium arsenide, indium arsenide, gallium nitride, etc.), insulating materials (epoxy resin, polyester glass, silicon dioxide, polytetrafluoroethylene, etc.) , Glass, ceramics, etc.) or a combination thereof. The packaging substrate 230 includes opposite first and s...
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