A photoelectron emission source, its manufacturing method, and electron emission device
A technology of electron emission device and electron emission source, which is applied in the direction of electrode system manufacturing, discharge tube/lamp manufacturing, cold cathode manufacturing, etc. It can solve the problems of long response time and inability to directly realize high-frequency pulse emission of electrons.
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Embodiment 1
[0037] figure 1 It shows a flowchart of a method for manufacturing a photoelectron emission source provided by Embodiment 1 of the present invention, as figure 1 Shown, described manufacturing method comprises the following steps:
[0038] Step S11: Select a conductive substrate suitable for carbon nanotube growth;
[0039] Step S12: depositing a catalyst layer on the conductive substrate;
[0040] Step S13: growing carbon nanotubes on the catalyst layer.
[0041] Figure 2a-2c A cross-sectional view of the structure corresponding to each step of the manufacturing method of the photoelectron emission source provided according to Embodiment 1 of the present invention is shown.
[0042] Such as Figure 2a As shown, a conductive substrate 201 suitable for carbon nanotube growth is selected.
[0043] The conductive substrate 201 is a doped silicon substrate, a metal substrate or a two-dimensional conductive material substrate. Among them, the doped silicon substrate is a hi...
Embodiment 2
[0060] Figure 6 A flowchart showing a method for manufacturing a photoelectron emission source provided in Embodiment 2 of the present invention; Figure 6 As shown, the described method comprises the following steps:
[0061] Step S61: Select a conductive substrate suitable for carbon nanotube growth.
[0062] Step S62: preparing a patterned catalyst layer on the conductive substrate as required.
[0063] Step S63: growing carbon nanotubes on the catalyst layer.
[0064] Figures 7a-7c A cross-sectional view of the structure corresponding to each step of the manufacturing method of the photoelectron emission source provided according to the second embodiment of the present invention is shown.
[0065] Such as Figure 7a As shown, a conductive substrate 701 suitable for carbon nanotube growth is selected.
[0066] The conductive substrate 701 is a doped silicon substrate, a metal substrate or a two-dimensional conductive material substrate. Among them, the doped silico...
Embodiment 3
[0079] Figure 10 It shows a structural diagram of an electron emission device provided by Embodiment 3 of the present invention, wherein the arrows represent the light emitted by the light source; the photoelectron emission source prepared in the above embodiment is applied to the photoelectron emission device, as Figure 10 As shown, the electron emission device includes:
[0080] Vacuum cavity 1001 , anode 1002 , electron emission source 1003 , cathode support 1004 , first kovar 1005 , second kovar 1006 , light source 1007 , beam focusing system 1008 , anode lead 1009 and cathode lead 1010 .
[0081] The vacuum cavity 1001 is provided with an anode 1002, an electron emission source 1003 and a cathode support 1004; wherein, the vacuum cavity 1001 can be made of glass or stainless steel with an incident window, such as 304 steel.
[0082] The electron emission source 1003 is arranged on the cathode support 1004, and the electron emission source 1003 is opposite to the anode ...
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Abstract
Description
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