Sensitivity radioactive ray resin composite, hard coating film, formation method thereof, and display element

A resin composition and radiation-sensitive technology, which is applied in the direction of photosensitive materials used in optomechanical equipment, etc., to achieve the effects of excellent pattern adhesion, excellent transparency, and excellent radiation sensitivity

Inactive Publication Date: 2016-02-03
JSR CORPORATIOON
View PDF7 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the conventional radiation-sensitive resin compositions do not fully satisfy these requirements.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sensitivity radioactive ray resin composite, hard coating film, formation method thereof, and display element
  • Sensitivity radioactive ray resin composite, hard coating film, formation method thereof, and display element
  • Sensitivity radioactive ray resin composite, hard coating film, formation method thereof, and display element

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0214]

[0215] The radiation-sensitive resin composition is prepared, for example, by mixing [A] the polymer component and [B] the radiation-sensitive acid generator, optional preferred components, and other optional components in a [H] solvent to dissolve or scattered state.

[0216]

[0217] The cured film of this invention is formed from the said radiation sensitive resin composition. Since the said cured film is formed from the said radiation sensitive resin composition, it is excellent in radiation sensitivity, chemical resistance, transparency, the pattern adhesiveness after image development, and the pattern adhesiveness after exposure-standing. The cured film having such characteristics can be used, for example, as an interlayer insulating film, a planarizing film, a bank (partition wall), a spacer, a protective film, etc. Coloring patterns for color filters, etc. In addition, the formation method of the said cured film is not specifically limited, It is prefera...

Embodiment

[0244] Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to these Examples. In addition, the weight average molecular weight (Mw) of [A] polymer component is measured by the following method.

[0245] [Weight average molecular weight (Mw)]

[0246] It measured by gel permeation chromatography (GPC) under the following conditions.

[0247] Device: Showa Denko "GPC-101"

[0248] Column: combine GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804

[0249] Mobile phase: tetrahydrofuran

[0250] Column temperature: 40°C

[0251] Flow rate: 1.0mL / min

[0252] Sample concentration: 1.0% by mass

[0253] Sample injection volume: 100μL

[0254] Detector: Differential refractometer

[0255] Standard material: monodisperse polystyrene

[0256]

[0257] The compound used for synthesis|combination of [A] polymer component is shown below.

[0258] M-1: Trimethylsilyl methacrylate

[0259] M-2: Triethylsilyl methacry...

Synthetic example 1

[0277] [Synthesis Example 1] (Synthesis of Polymer (A-1))

[0278] Into a flask equipped with a cooling tube and a stirrer, 5 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by mass of methyl-3-methoxypropionate were charged. 30 parts by mass of the compound (M-1), 40 parts by mass of the compound (M-3), and 30 parts by mass of the compound (M-7) were charged into the flask and replaced with nitrogen, and then stirring was gradually started. The temperature of the solution was raised to 70° C., and the temperature was maintained for 6 hours, whereby a polymer solution containing the polymer (A-1) was obtained. The solid content concentration of the polymer solution was 32.5% by mass. Polystyrene conversion weight average molecular weight (Mw) of polymer (A-1) was 10,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The present invention provides a sensitivity radioactive ray resin composite, a hard coating film formed by the composite, a formation method thereof, and a display element. The sensitivity radioactive ray resin composite is excellent in the radioactive ray sensitivity and storage stability, and can form chemical resistance and pattern adaptation after development and exposure, and is excellent in transparency. The resin composite contains: [A] polymer composition containing the group and the structural unit with a crosslinked base shown in the formula (1), and [B] the sensitivity radioactive ray linear acid generation body containing at least one of the oxime sulfonic acid ester based compound and the N - imide sulfonyl oxygen radical compound shown in the formula (2).

Description

technical field [0001] The present invention relates to a radiation-sensitive resin composition, a cured film, a method for forming the same, and a display element. Background technique [0002] A display element such as a thin film transistor liquid crystal display element or an organic electroluminescence device (organic electroluminescence device, organic EL element) generally includes an insulating film such as an interlayer insulating film or a planarizing film. The insulating film is usually formed using a radiation-sensitive composition. As the radiation-sensitive composition, a positive-type radiation-sensitive resin composition using an acid generator such as naphthoquinonediazide (refer to Japanese Patent Laid-Open No. 2001- 354822 bulletin), in recent years proposed a variety of radiation-sensitive composition. [0003] As an example, a positive-type chemical amplification material has been proposed for the purpose of forming a display element with a higher sens...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004
Inventor 成子朗人
Owner JSR CORPORATIOON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products