Patterning method of quantum dot layer and preparation method of quantum dot color film

Abstract

The invention provides a patterning method of a quantum dot layer and a preparation method of a quantum dot color film. According to the patterning method of the quantum dot layer, a light resistant layer having a pattern structure serves as a shielding layer, and a single-color quantum dot layer is etched to obtain a patterned quantum dot layer. By the method, the constituents for forming quantum dot glue of the quantum dot layer are simplified, namely, the surface chemical environment of a quantum dot is simplified, and thus, the luminous efficiency of the quantum dot is improved; moreover, an exquisite quantum dot pattern can be fabricated according to the method, and the display resolution of the patterned quantum dot layer is greatly improved. The invention relates to the preparation method of the quantum dot color film. The quantum dot color film is prepared according to the above patterning method of the quantum dot layer, the prepared quantum dot color film has the exquisite quantum dot pattern, the luminous efficiency of the quantum dot is also high, and the resolution and the backlight utilization rate of a display device are further effectively improved.

Description

Technical field [0001] The invention relates to the field of display technology, in particular to a method for patterning a quantum dot layer and a method for preparing a quantum dot color film. Background technique [0002] With the continuous development of display technology, people have higher and higher requirements for display quality of display devices. Quantum Dots (QDs for short) are usually spherical or quasi-spherical semiconductor nanoparticles composed of II-VI or III-V group elements, and the particle size is generally between several nanometers and tens of nanometers. Since the particle size of QDs is smaller than or close to the exciton Bohr radius of the corresponding bulk material, quantum confinement effects will occur, and the energy level structure of the QDs will change from the quasi-continuous bulk material to the discrete structure of the quantum dot material, which leads to the special display of QDs. The performance of stimulated radiation. As the siz...

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Problems solved by technology

For example, the patent CN102944943A and the patent US20150002788A1 both proposed a technical solution to replace the color filter film (ColorFilter) with a patterned quantum dot layer to achieve the purpose of color display, but these patents did not carry out the method of patterning the quantum dot layer. illustrate

[0004] Patent CN103226260A provides a method of dispersing quantum dots in photoresist and patterning the quantum dot layer by photolithography, but quantum dots are dispersed in photoresist, because there is an initiator (initiation) in the photoresist , polymer monomer (monomer), polymer (polymer), additive (additive) and other polymer materials, the surface chemical environment of quantum dots is complex, which greatly affects the luminous efficiency of quantum dots

In addition to the above methods, quantum dot graphics can also be produced by transfer printing, screen printing, etc., but the resolution of the quantum dot graphics obtained by the transfer printing method is not high, the edges of the graphics are jagged, and the quantum dot layer and the matrix Adhesion needs to be improved; while the method of inkjet printing to form a patterned quantum dot layer has high requirements on inkjet printing equipment, how to ensure the stability of inkjet ink droplets and printing accuracy still has technical barriers, and it still cannot be mass-produced

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