A fast three-dimensional super-resolution microscopy method and device

A super-resolution and fast technology, applied in the field of super-resolution, can solve the problems of increasing the time complexity of the microscopic system, increasing the space complexity of the optical microscopic system, etc., and achieve the effect of simple device

Inactive Publication Date: 2018-02-13
ZHEJIANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Stimulated fluorescence microscopy has the advantages of low power consumption, weak bleaching, fast imaging, and simple optical path. However, when it is applied to three-dimensional super-resolution microscopy imaging, it is necessary to divide the excitation light into three channels and modulate them separately. The modulated three-way beams are combined, which undoubtedly greatly increases the space complexity of the optical microscope system
In addition, it is necessary to design a three-way shutter switch to control the switching of the excitation light mode, which also greatly increases the time complexity of the microscope system.

Method used

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  • A fast three-dimensional super-resolution microscopy method and device
  • A fast three-dimensional super-resolution microscopy method and device
  • A fast three-dimensional super-resolution microscopy method and device

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Embodiment Construction

[0050] Such as figure 1 As shown, a fast three-dimensional super-resolution microscopy device includes: laser 1, single-mode fiber 2, collimator lens 3, polarizer 4, 1 / 2 wave plate 5, spatial light modulator 6, spatial light modulation 7, reflector 8, beam splitter 9, scanning galvanometer system 10, scanning lens 11, field lens 12, quarter wave plate 13, microscope objective lens 14, nano-displacement stage 15, band pass filter 16, focusing Lens 17, pinhole 18, detector 19 and controller 20.

[0051] Among them, the single-mode fiber 2, the collimating lens 3, the polarizer 4, the 1 / 2 wave plate 5 and the spatial light modulator 6 are sequentially located above the optical axis of the beam emitted by the laser 1.

[0052] Among them, the spatial light modulator 7 and the mirror 8 are sequentially located above the optical axis of the light beam modulated by the spatial light modulator 6.

[0053] Among them, the beam splitter 9 and the scanning galvanometer system 10 are sequentia...

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Abstract

The invention discloses a rapid three-dimensional super-resolution microscopic method. The method comprises that a laser beam is converted into linearly polarized light after being collimated, phase modulation is carried out on the linearly polarized light, the linearly polarized light is converted into circularly polarized light, the circularly polarized light is projected to a sample to be measured, and pilot light emitted by scanning points of the sample to be measured is collected; and 3D scanning is carried out on the sample. Phase modulation comprises primary phase modulation and secondary phase modulation, a spatial light modulator which modulates the phase of an s light component of the linearly polarized light is used in the primary phase modulation, a spatial light modulator which modulates the phase of a p light component of the linearly polarized light is used in the secondary phase modulation, and a 3D super-resolution image is obtained according to the effective pilot light intensity. The invention also discloses a rapid 3D super-resolution microscopic device. According to the invention, optical power is lower, the photobleaching effect is weakened, 3D imaging is rapid, the device is simple, and light splitting is not needed.

Description

Technical field [0001] The invention belongs to the field of super-resolution, and particularly relates to a method and device capable of quickly realizing three-dimensional super-diffraction limit resolution in a far field. Background technique [0002] Optical microscopic imaging is a commonly used and effective means to observe submicron microstructures. However, the existence of optical diffraction limit greatly limits the resolution of optical microscopic imaging. According to the principle of Abbe's diffraction limit, the ideal point light source is not an ideal image point after being focused by the microscope objective, but a diffraction spot. Its size is the full width at half maximum of the intensity distribution curve of the diffraction spot. To measure, where λ is the wavelength of the illumination light used by the microscope, NA is the numerical aperture of the microscope objective used, since NA=n sinα, where n is the refractive index of the medium between the obse...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B21/00G01B11/24
CPCG01B11/24G02B21/0032G02B21/0068
Inventor 刘旭荣子豪赵光远
Owner ZHEJIANG UNIV
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