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Transparent electrode and method for producing same

A transparent electrode, transparent conductivity technology, applied in transparent dielectric, printed circuit manufacturing, cable/conductor manufacturing, etc., can solve problems such as unfavorable productivity and increased manufacturing processes

Active Publication Date: 2016-04-13
株式会社力森诺科
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since a two-layer structure is formed to ensure surface smoothness, the number of manufacturing steps increases, which is disadvantageous in terms of productivity

Method used

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  • Transparent electrode and method for producing same
  • Transparent electrode and method for producing same
  • Transparent electrode and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0083] When preparing transparent conductive ink, use commercially available silver nanowire dispersion liquid SLV-NW-35 (isopropyl alcohol dispersion liquid manufactured by bluenano company, concentration 10mg / mL, silver nanowire diameter 35nm, length about 15μm (catalogue value) )) as raw material. To 25 mL of the silver nanowire dispersion liquid, 0.75 g of polyvinylpyrrolidone (manufactured by Nippon Shokubai) dissolved in 4.8 g of dipropylene glycol monomethyl ether (purchased as a reagent from Kanto Chemical Co., Ltd.) was added at room temperature. g solution, after mixing, the isopropanol was distilled off and the solvent was replaced. After that, 19.2 g of Terusolbu MTPH (Isobornylcyclohexanol manufactured by Nippon Terupen Chemical Co., Ltd.) was added, and stirred at a rotation speed of 1200 rpm for 3 hours using a rotation and revolution vacuum mixer Awatori Rentaro ARV-310 manufactured by Shinki Corporation. minutes, a transparent conductive ink having a concentr...

Embodiment 2～6、8

[0085] Except changing the concentration of the dipropylene glycol monomethyl ether solution of polyvinylpyrrolidone and the amount of tersolub MTPH added to 25 mL of SLV-NW-35, the same operations as in Example 1 were carried out, respectively.

Embodiment 7

[0087] The ethanol dispersion of silver nanowires obtained by the above synthesis was used as a raw material. A transparent conductive ink was prepared in the same manner as in Example 1 using SLV-NW-35 except that the dispersion solvent was ethanol and the concentration was 0.2% by mass.

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Abstract

To provide: a transparent electrode which uses metal nanowires and / or metal nanotubes as a conductive component and has surface smoothness, conductivity and light transmittance at the same time, while exhibiting high productivity; and a method for producing this transparent electrode. A transparent electrode which has a surface resistivity of 0.1-500 [Omega] / - and a surface arithmetic average roughness (Ra) satisfying Ra <= 5 nm is obtained by: printing an electrode pattern of a desired form on a substrate with use of a transparent conductive ink that is obtained by dispersing metal nanowires and / or metal nanotubes in a solution, which is obtained by dissolving, in a solvent, a thermosetting or thermoplastic binder resin that does not exhibit fluidity in the temperature range of 5-40 DEG C, said transparent conductive ink containing 100-2,500 parts by mass of the binder resin per 100 parts by mass of the metal nanowires and / or the metal nanotubes; and then irradiating the printed electrode pattern with pulsed light.

Description

technical field [0001] The present invention relates to a transparent electrode and a manufacturing method thereof. Background technique [0002] Organic EL (electroluminescent) displays, display devices such as liquid crystal displays, touch panels used in tablet terminals such as smartphones, and various input devices, solar cells, etc., transparent electrodes that transmit light are essential components part. [0003] Currently, ITO (indium tin oxide) is used as a transparent conductive film used in these transparent electrodes. However, indium used for ITO is a rare metal, and therefore, stabilization of supply and price has become a problem in recent years. In addition, since sputtering, vapor deposition, and the like are used to form a film of ITO, a vacuum manufacturing device is required, and not only the manufacturing time is long, but also the cost is high. In addition, since ITO is easily cracked and destroyed due to physical stress such as bending, it is diffi...

Claims

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Application Information

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IPC IPC(8): H01B5/14B32B27/18H01B1/22H01B13/00
CPCH01B1/22C09D11/106C09D11/52H05K1/0306H05K1/097H05K3/106H05K2201/0108H05K2201/026H05K1/0373H05K1/09H05K3/1283
Inventor 内田博宫村泰直冈崎惠理大籏英树
Owner 株式会社力森诺科
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