Method for preparing copper-indium-diselenide photoelectric film by two-step method of nitrate system
A photoelectric thin film, copper indium selenide technology, applied in photovoltaic power generation, circuits, electrical components, etc., to achieve the effects of easy operation, low equipment requirements, and low production costs
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[0036] a. Cleaning of tin dioxide conductive glass substrate: cleaning the glass substrate as described above, the size of the substrate is 20mm×20mm.
[0037] b. Put 1.0 copies of C 6 H 5 Na 3 O 7 ·2H 2 O, 6.5 parts Cu(NO 3 ) 2 ·3H 2 O, 10.0 parts In(NO 3 ) 3 ·4.5H 2 O, 6.0 parts SeO 2 Put into 2700.0 parts of distilled water to dissolve the substance in the solution.
[0038] c. Pour the above-mentioned electrodeposition solution into a three-electrode device, using a saturated calomel electrode as a reference electrode, a platinum electrode as an auxiliary electrode, and tin dioxide conductive glass as a research electrode, using a transistor potentiostat at a deposition potential of -0.5 The film was deposited at room temperature under V, the deposition time was 30 minutes, and the precursor film sample was obtained by natural drying.
[0039] d. Place the precursor film sample on the holder, add selenium powder to the hydrazine hydrate, the precursor film sample does not contact...
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