Electric contact material for connector, and method for producing same
A manufacturing method and technology of electrical contacts, applied in conductive materials, conductive materials, circuits, etc., to achieve the effects of stabilizing contact resistance, maintaining contact resistance for a long time, and improving durability
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Embodiment 1
[0057] The electrical contact material for connectors mentioned above and its manufacturing method are demonstrated using drawings.
[0058] Such as figure 2 As shown, the electrical contact material 1 of this example has: a base material 10 made of a metal material, a ternary alloy layer 2 containing Sn and Cu and also containing Ni formed on the base material 10, and a ternary alloy layer 2 formed on the surface of the alloy layer 2 The formed conductive coating layer 3 . Alloy layer 2 contains Cu 6 sn 5 (Cu,Ni) obtained by substituting a part of Cu in Ni 6 sn 5 intermetallic compound. Hereinafter, the manufacturing method and more detailed structure of the electrical contact material 1 are demonstrated.
[0059]
[0060] First, a plate-shaped material made of brass was prepared as the base material 10 . In addition, the material and form of the base material 10 can be changed variously according to a use. In addition, in this example, a diffusion barrier layer wa...
Embodiment 2
[0095] In the electrical contact material for connectors of this example, the alloy layer 2 in Example 1 is changed to a ternary alloy layer containing Sn and Cu and Zn, and accordingly, the composition of the conductive coating layer 3 is also changed. example of .
[0096]
[0097] It manufactured similarly to Example 1 except having performed formation of a Zn layer instead of forming a Ni layer in Example 1.
[0098] (Formation of Zn layer)
[0099] · Liquid composition of the plating bath
[0100] · Zinc chloride [ZnCl 2 ]: 60g / L
[0101] Sodium chloride [NaCl]: 35g / L
[0102] Sodium hydroxide [NaOH]: 80g / L
[0103] Liquid temperature: 25°C
[0104] ·Current density: 1A / dm 2
[0105]
[0106] The composition of the alloy layer obtained in this example was analyzed by EDX. As a result, it was found that (Cu, Zn) 6 sn 5 metal compounds. In addition, the composition analysis of the obtained conductive coating layer of this example was carried out by XPS. As a ...
Embodiment 3
[0111] In the electrical contact material for connectors of this example, the alloy layer 2 in Example 1 is changed to a ternary alloy layer containing Sn and Cu and Co, and accordingly, the composition of the conductive coating layer 3 is also changed. example of .
[0112]
[0113] It manufactured in the same manner as in Example 1 except having performed formation of a Co layer instead of forming a Ni layer in Example 1.
[0114] (Formation of Co layer)
[0115] · Liquid composition of the plating bath
[0116] Cobalt chloride [CoCl 2 ]: 250g / L
[0117] Hydrochloric acid [HCl]: 50g / L
[0118] Liquid temperature: 40°C
[0119] ·Current density: 2A / dm 2
[0120]
[0121] The composition of the alloy layer obtained in this example was analyzed by EDX. As a result, it was found that (Cu, Co) 6 sn 5 metal compounds. In addition, composition analysis of the obtained conductive coating layer of this example by XPS revealed that a mixed oxide of Sn oxide, Cu oxide, an...
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