Electromagnetic drive type graphite inlaying probe adopting arc sputtering

Abstract

The invention provides an electromagnetic drive type graphite inlaying probe adopting arc sputtering, and belongs to the technical field of mechanical design and electronic engineering. The electromagnetic drive type graphite inlaying probe comprises a vibration generation device and a passive arc generation circuit, wherein the vibration generation device is used for generating mechanical vibration with certain frequency and amplitude, so that a graphite rod is periodically contacted with a to-be-processed film electrode, and an arc generation condition of the passive arc generation circuit is met; the passive arc generation circuit is used for generating arc light discharge between the graphite rod and the film electrode at the separation moment of the graphite rod and the to-be-processed film electrode, and multiple types of high-velocity particles produced in the discharge process strike the graphite rod, so that graphite particles are separated from the graphite rod and are inlaid on the surface of the film electrode. According to the probe, equipment required by graphite inlaying processing on the surface of the film electrode is simplified and reduced, so that the production speed is greatly increased, the processing quality is greatly improved, and large-scale production of modified film electrode pole pieces becomes possible.

Description

technical field [0001] The invention belongs to the technical field of mechanical design and electronic engineering, and in particular relates to an electromagnetically driven graphite arc sputtering mosaic probe for improving the conductive properties (especially resistivity) of thin film electrodes. Background technique [0002] Thin-film electrodes are widely used as conductive components in energy storage devices such as lithium-ion batteries and supercapacitors. In order to make the film electrode have more stable chemical characteristics and reduce the resistance of the film electrode, a certain number of micron-scale graphite particles can be embedded on the surface of the film electrode. [0003] At present, there are mainly three methods for realizing graphite particle inlaying: vacuum cathode sputtering, vacuum bias evaporation, and vacuum arc sputtering. Although the three methods are implemented in different ways, the basic principle is the same: under the prote...

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Problems solved by technology

This results in a bulky and complex structure for the graphite mosaic processing equipment, and the processing process requires manual replacement of the thin film electrodes and graphite raw materials to be processed.

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