Manufacturing method of TFT substrate and prepared TFT substrate
一种制作方法、基板的技术,应用在半导体/固态器件制造、仪器、半导体器件等方向,能够解决TFT电性稳定性劣化、多光罩次数、生产成本高等问题,达到减少光罩次数、提高生产效率、生产成本低的效果
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[0048] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0049] see figure 1 , the invention provides a kind of manufacturing method of TFT substrate, comprises the following steps:
[0050] Step 1, such as figure 2 As shown, a substrate 10 is provided, and a transparent conductive film 11 and a light-shielding film 12 are sequentially deposited on the substrate 10 .
[0051] Specifically, the substrate 10 is a transparent substrate, preferably a glass substrate.
[0052] Specifically, in the step 1, before depositing the transparent conductive film 11 on the substrate 10, the substrate 10 needs to be cleaned.
[0053] Specifically, the material of the transparent conductive film 11 is a transparent conductive metal oxide, such as indium tin oxide (ITO), indium zinc oxide (IZO), aluminum tin oxi...
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