Seawater-corrosion-resistant hard coating and preparation method thereof
A hard coating, seawater-resistant technology, used in coatings, metal material coating processes, ion implantation plating, etc., can solve the problem of weakened impact resistance, reduced hardness and toughness of coatings, and scratch resistance Insufficient rubbing ability and other problems, to achieve the effect of enhancing corrosion resistance, compact structure and convenient industrial production
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Embodiment 1
[0049] Choose polished 304 stainless steel as the substrate, first clean it, then put it into 60% detergent solution, saturated with Na 2 CO 3 Solution, acetone, absolute ethanol, and deionized water were ultrasonically cleaned for 20 minutes, and then dried in a drying oven at a temperature of 100 ° C for 2 hours. Put the cleaned substrate on the rotatable sample stage in the vacuum chamber, and use plasma glow to etch and clean it for 15 minutes. When the chamber vacuum is less than 1×10 -5 Pa, rush into Ar gas and adjust the sputtering pressure to 0.7Pa, select the composition as Ti 45 B 55 target, adjust the power density of the target to 4.5W / cm 2 , and apply a bias of -20V to the substrate and heat at 200°C, then open the baffle, and deposit on the main surface of the substrate for 200min to obtain a composition of Ti 100-x B x , X = 55 hard coating. The coating thickness is 4 μm. Such as figure 1 (a) As shown in the XRD pattern, the coating has an amorphous str...
Embodiment 2
[0051] Choose polished 304 stainless steel as the substrate, first clean it, then put it into a 30% detergent solution, and saturate it with Na 2 CO 3 Solution, acetone, absolute ethanol, and deionized water were ultrasonically cleaned for 10 minutes, and then dried in a drying oven at a temperature of 100 ° C for 2 hours. Put the cleaned substrate on the rotatable sample stage in the vacuum chamber, and use plasma glow to etch and clean it for 20 minutes. When the chamber vacuum is less than 1×10 -5 Pa, rush into Ar gas and adjust the sputtering pressure to 0.3Pa, select the composition as Ti 50 B 50 target, adjust the power density of the target to 5.5W / cm 2 , and the substrate was grounded and heated at 100°C, then the baffle was opened, and the main surface of the substrate was deposited for 120min, and the obtained composition was Ti 100-x B x Hard coat, X=50. Coating thickness 2 μm. The coating has an amorphous structure. The coating is dense with a density of 4...
Embodiment 3
[0053] Choose polished 304 stainless steel as the substrate, first clean it, then put it into a 30% detergent solution, and saturate it with Na 2 CO 3 Solution, acetone, absolute ethanol, and deionized water were ultrasonically cleaned for 15 minutes, and then air-dried in a drying oven at a temperature of 100 °C for 2 hours. Put the cleaned substrate on the rotatable sample stage in the vacuum chamber, and use plasma glow to etch and clean it for 20 minutes. When the chamber vacuum is less than 1×10 -5 Pa, rush into Ar gas and adjust the sputtering pressure to 0.3Pa, select the composition as Ti 42 B 58 target, adjust the power density of the target to 5.0W / cm 2 , and the substrate was biased at -10V and heated at 150°C, then the baffle was opened, and the main surface of the substrate was deposited for 300min to obtain a composition of Ti 100-x B x , X = 58 hard coating. The coating thickness is 5 μm. The surface roughness is Ra≦13nm. The coating has an amorphous st...
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