Phosphorus diffusion method of crystalline silicon solar cell
A solar cell and phosphorus diffusion technology, which is applied in the field of solar cells, can solve problems such as inconsistent PN junctions, large differences, and large temperature fluctuations, and achieve the effects of improved inter-chip uniformity, low cost, and reduced recombination centers
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[0035] A phosphorus diffusion method for a crystalline silicon solar cell, comprising the steps of:
[0036] (1) Raise the temperature of the diffusion furnace to 780°C, and the maximum nitrogen flow rate is 20,000 sccm; enter the boat, and the time of entering the boat is controlled at 600-800 seconds;
[0037] (2) The temperature is raised to 790° C., the maximum nitrogen flow is 20000 sccm, and the pressure in the furnace is controlled at 100 mba; the temperature adjustment time is controlled at 600 to 800 seconds;
[0038] (3) Keep the above temperature, pressure and large nitrogen flow rate constant, and at the same time introduce phosphorus-carrying source gas and dry oxygen to carry out low-temperature diffusion, and the diffusion time is 600 to 900 seconds;
[0039] The flow rate of the oxygen is 1500 sccm;
[0040] The flow rate of the phosphorus source gas is 1L / min;
[0041] (4) Stop feeding the phosphorus-carrying source gas and dry oxygen, raise the temperature ...
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