Mask film plate and manufacturing method thereof
A mask and display substrate technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of prone to wrinkles, large differences, no evaporation of organic materials, etc., to improve the flatness degree, ensure quality, and improve the effect of product quality
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Problems solved by technology
 The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
 In order to avoid the appearance of wrinkles, the current approach is: for FMM, half-etched (HalfEtch) areas are designed around the area corresponding to the active area (ActiveArea) of each Panel and at both ends of the assembly area. Easy to understand, please refer to Figure 2A ( Figure 2A It is a schematic diagram of the distribution of the half-etched area on a 1 / 4 vapor-deposited substrate according to the prior art). S...
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