A kind of preparation method of partial back field n-type solar cell
A solar cell and local back field technology, applied in the field of solar cells, to achieve the effects of low contact resistance, high fill factor, and low Auger recombination
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[0035] The present invention will be described in detail below in conjunction with the embodiments and the accompanying drawings. It should be noted that the described embodiments are only intended to facilitate the understanding of the present invention, rather than limiting it in any way.
[0036] see Figure 1 to Figure 9 As shown, the preparation method of a local back field N-type solar cell provided in this embodiment comprises the following steps:
[0037] (1), select the N-type crystalline silicon substrate 10 of 156mm * 156mm, and do texture processing to the front surface of the N-type crystalline silicon substrate 10; The resistivity of the N-type crystalline silicon substrate 10 is 0.5~15Ω·cm, preferably 1 ~5Ω·cm; the thickness of the N-type crystalline silicon substrate 10 is 50-300 μm, preferably 80-200 μm; the battery structure after this step is as follows figure 1 shown.
[0038] (2), put the N-type crystalline silicon substrate 10 processed in step (1) into...
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