Unlock instant, AI-driven research and patent intelligence for your innovation.

A kind of preparation method of partial back field n-type solar cell

A solar cell and local back field technology, applied in the field of solar cells, to achieve the effects of low contact resistance, high fill factor, and low Auger recombination

Active Publication Date: 2017-10-03
TAIZHOU ZHONGLAI PHOTOELECTRIC TECH CO LTD
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing technology cannot well solve the contradiction between the fill factor brought by the n+ type doped region on the back surface and the open circuit voltage and short circuit current

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of preparation method of partial back field n-type solar cell
  • A kind of preparation method of partial back field n-type solar cell
  • A kind of preparation method of partial back field n-type solar cell

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The present invention will be described in detail below in conjunction with the embodiments and the accompanying drawings. It should be noted that the described embodiments are only intended to facilitate the understanding of the present invention, rather than limiting it in any way.

[0036] see Figure 1 to Figure 9 As shown, the preparation method of a local back field N-type solar cell provided in this embodiment comprises the following steps:

[0037] (1), select the N-type crystalline silicon substrate 10 of 156mm * 156mm, and do texture processing to the front surface of the N-type crystalline silicon substrate 10; The resistivity of the N-type crystalline silicon substrate 10 is 0.5~15Ω·cm, preferably 1 ~5Ω·cm; the thickness of the N-type crystalline silicon substrate 10 is 50-300 μm, preferably 80-200 μm; the battery structure after this step is as follows figure 1 shown.

[0038] (2), put the N-type crystalline silicon substrate 10 processed in step (1) into...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a local back field N type solar cell, a preparation method thereof, a local back field N type solar cell assembly and a local back field N type solar cell system. The preparation method of the local back field N type solar cell includes the following steps that: doping is performed on an N type crystalline silicon base body, barrier layers are grown, and then, a mask which is in an auxiliary grid-shaped pattern and is formed by acid-resisting slurry is printed on the back surface of the N type crystalline silicon base body; the silicon base body is immersed in an acid solution, so that the barrier layer not covered with the mask can be removed; the silicon base body is immersed in an alkaline solution, so that the mask can be removed, and etching is performed on other regions, and an n+ heavy doped region under the mask is retained; and the silicon base body is immersed in the acid solution again, so that the barrier layers left on the silicon base body can be removed; and finally electrodes are prepared, the preparation of the back field N type solar cell is completed. According to the preparation method of the invention, since back surface auxiliary grids only contact with local n+ heavy doped regions, so that contact resistance is low; and regions which do not contact with the back surface auxiliary grids are non-doped regions, so that Auger recombination is low. The prepared cell has high photoelectric conversion efficiency.

Description

technical field [0001] The invention relates to the technical field of solar cells, in particular to a method for preparing a partial back field N-type solar cell. Background technique [0002] A solar cell is a semiconductor device that converts solar energy into electricity. At present, the mainstream products in the industry are P-type crystalline silicon solar cells. The battery process is simple, but it has a light-induced decay effect, that is, the efficiency of the battery will gradually decay with time, which is mainly due to the combination of boron atoms doped into the P-type silicon substrate and oxygen atoms in the substrate. Produces boron-oxygen pair results. Studies have shown that the boron-oxygen pair acts as a carrier trap, reducing the minority carrier lifetime, which leads to the attenuation of the photoelectric conversion efficiency of the battery. Compared with P-type crystalline silicon solar cells, N-type crystalline silicon solar cells have the ad...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0224H01L31/042H01L31/05H01L31/18
CPCH01L31/022441H01L31/042H01L31/0516Y02E10/50Y02P70/50
Inventor 林建伟季根华刘志锋孙玉海张育政
Owner TAIZHOU ZHONGLAI PHOTOELECTRIC TECH CO LTD