Polyimide precursor and resin composition containing same
A technology of polyimide precursor and diaminobenzanilide, which is applied in the field of polyimide precursor and resin composition containing it, can solve the problem that it is difficult to use in fields requiring transparency, low transmittance, etc. problems, to achieve the effect of excellent storage stability, high elongation, and excellent transparency
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preparation example Construction
[0158] The solution can be directly used for the preparation of the resin composition, or
[0159] The polyimide precursor contained in this solution may be used for preparation of a resin composition after isolation|separation and purification.
[0160]
[0161] The resin composition of this embodiment contains the above-mentioned polyimide precursor and a solvent, and may contain other additives as needed.
[0162] As such other additives, an alkoxysilane compound, surfactant, a leveling agent, etc. are mentioned, for example.
[0163] (alkoxysilane compound)
[0164] When the polyimide obtained from the resin composition of this embodiment is used as an element such as a TFT, in order to maintain sufficient adhesion between the resin composition and the support, the resin composition may contain 0.001 to 2% by mass of an alkoxysilane compound.
[0165] When content of an alkoxysilane compound is 0.01 mass % or more with respect to 100 mass % of polyimide precursors, it...
Embodiment
[0217] Hereinafter, the present invention will be specifically described based on examples. These are described for explanation, and the scope of the present invention is not limited to the following examples.
[0218] Various evaluations in Examples and Comparative Examples are as follows.
[0219] (Determination of weight average molecular weight)
[0220] The weight average molecular weight is measured under the following conditions using gel permeation chromatography (GPC). A calibration curve for calculating the weight average molecular weight was prepared using standard polystyrene (manufactured by Tosoh Corporation).
[0221] Solvent: N,N-dimethylformamide (manufactured by Wako Pure Chemical Industries, Ltd., for high performance liquid chromatography) was used, and 24.8 mmol / L of lithium bromide monohydrate (manufactured by Wako Pure Chemical Industries, Ltd.) was added immediately before measurement , purity 99.5%) and phosphoric acid of 63.2 mmol / L (manufactured b...
reference example 1
[0284] Under a nitrogen atmosphere, 15.69 g (49.00 mmol) of 2,2'-bis(trifluoromethyl)benzidine (TFMB) and 178.95 g of N-methyl-2-pyrrolidone (NMP) were added to a 500 ml separable flask , dissolve TFMB under stirring. Thereafter, 1.09 g (5.0 mmol) of pyromellitic dianhydride (PMDA), 3.10 g (10.0 mmol) of 4,4'-oxodiphthalic dianhydride (ODPA) and 1,2,3, 6.86 g (35.0 mmol) of 4-cyclobutanetetracarboxylic dianhydrides (CBDA) were stirred at 80 degreeC for 4 hours, and the NMP solution (it is also called "varnish" hereafter.) of a polyamic acid was obtained. The weight average molecular weight (Mw) of the obtained polyamic acid was 116,500. The CTE, YI value, and elongation of the film cured at 330° C. are shown in Table 2 below.
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