Multistage vacuum adsorption device for polishing of magnetorheological plane and machining method of multistage vacuum adsorption device

A vacuum adsorption, magnetorheological technology, applied in the direction of grinding workpiece supports, etc., can solve the problems of the surface accuracy of the substrate affecting the clamping parts, the effective clamping of the workpiece is not well solved, and broken, etc., to achieve the clamping method. Convenient and practical effects

Active Publication Date: 2016-10-26
GUANGDONG UNIV OF TECH
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  • Claims
  • Application Information

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Problems solved by technology

[0005] Patent CN200610132495.9 arrays a plurality of magnetic bodies in an orderly manner on the base of a diamagnetic material polishing disc to realize clustered magneto-rheological effect plane polishing, which improves the polishing efficiency and polishing area, and realizes the processing of large-sized workpieces, but clusters The problem of effective clamping of workpieces in magnetorheological plane polishing has not been well resolved
At present, the widely used method is waxing, but this method is difficult to ensure the uniformity of the thickness of the wax layer, resulting in uneven surface of the workpiece, and the workpiece is prone to uneven heating and breakage during the removal process; ensure the surface of the substrate for clamping parts In the process of magnetorheological polishing, when the magnetorheological flexible polishing pad processes the workpiece with a certain gap, due to the thinner thickness of the workpiece, the flexible polishing pad can also keep in contact with the substrate of the clamping part, and the abrasive particles Under the action of the substrate, the substrate is worn, thereby affecting the surface accuracy of the substrate of the clamping part

Method used

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  • Multistage vacuum adsorption device for polishing of magnetorheological plane and machining method of multistage vacuum adsorption device
  • Multistage vacuum adsorption device for polishing of magnetorheological plane and machining method of multistage vacuum adsorption device
  • Multistage vacuum adsorption device for polishing of magnetorheological plane and machining method of multistage vacuum adsorption device

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Embodiment 1

[0030] Such as Figure 1 ~ Figure 3As shown, the multi-stage vacuum adsorption device for magnetorheological plane polishing of the present invention includes a vacuum adsorption generating device, a different stage conversion device, and a vacuum adsorption device. The vacuum adsorption generating device includes an air guide tube 1, a rotary joint 2, and a substrate 3 , the main shaft 16, the air guide joint 18, the conversion device of different stages includes the connection sleeve 4, the end cover 5, the manual ball valve 13, the connecting pipe 14, the vacuum adsorption device includes the three-stage fixing part 6, the three-stage porous ceramic disc 7, The secondary fixing part 8, the secondary porous ceramic disc 9, the primary fixing part 10, and the primary porous ceramic disc 11, wherein the air duct 1 and the rotary joint 2 are fixed together, and the rotary joint 2 is fixed above the main shaft 16, and the main shaft 16 It is fixed by the base body 3, the connect...

Embodiment 2

[0053] The structure of the present invention is the same as that of the first embodiment, except that the workpiece 26 is a three-inch single-crystal sapphire.

[0054] Such as Image 6 As shown, during work, the vacuum adsorption of the primary porous ceramic disc 11 and the secondary porous ceramic disc 9 drives the workpiece 26 to rotate, the workpiece 26 and the flexible micro-grinding head 29 keep in contact, and the tertiary porous ceramic disc 7 moves to the top, Avoid contact with the flexible micro-grinding head 29 to wear the surface.

[0055] In this embodiment, the preparation method of the magnetorheological fluid 27 is: add carbonyl iron powder with a mass percentage of 18% and an average particle diameter of 3.5 microns in the deionized water of the base carrier liquid, with a mass percentage of 6% and an average particle diameter of 5 micron diamond abrasive, 5% glycerin by mass percentage, and 3% by mass antirust agent.

[0056] In this embodiment, the abov...

Embodiment 3

[0062] The present invention is identical with the structure of embodiment one, and difference is that workpiece 26 is the monocrystalline silicon of four inches

[0063] Such as Figure 7 As shown, when working, the workpiece 26 is driven to rotate under the vacuum adsorption of the first-level porous ceramic disc 11, the second-level porous ceramic disc 9 and the third-level porous ceramic disc 7, and the workpiece 26 and the flexible micro-grinding head 29 keep in contact.

[0064] In this embodiment, the preparation method of the magnetorheological fluid 27 is: adding carbonyl iron powder with a mass percentage of 20% and an average particle diameter of 3.5 microns in the deionized water of the base carrier liquid, with a mass percentage of 6% and an average particle diameter of 1 micron aluminum oxide abrasive, 6% by mass of glycerin, and 4% by mass of antirust agent.

[0065] In this embodiment, the above-mentioned magnetorheological planar polishing uses a multi-stage ...

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Abstract

The invention discloses a multistage vacuum adsorption device for polishing of a magnetorheological plane and a machining method of the multistage vacuum adsorption device. The device comprises a vacuum adsorption generating device, a conversion device for different stage numbers and a vacuum adsorption device; the vacuum adsorption generating device comprises an air guiding pipe, a rotary connector, a base body, a main shaft and an air guiding connector; the conversion device for different stage numbers comprises a connection sleeve, an end cover, a manual ball valve and a connection pipe; and the vacuum adsorption device comprises a third-stage fixing piece, a third-stage porous ceramic disk, a second-stage fixing piece, a second-stage porous ceramic disk, a first-stage fixing piece and a first-stage porous ceramic disk. Based on the magnetorheological effect, the multistage vacuum adsorption device for polishing of the magnetorheological plane can clamp optical elements in different sizes in a vacuum adsorption manner under the situation that the porous ceramic disks are not abraded, and the vacuum adsorption device is low in cost, simple in structure, reliable in adsorption, convenient, practical and capable of being applicable to ultra-smooth magnetorheological polishing of planes of the optical elements in different sizes.

Description

technical field [0001] The invention relates to a multi-stage vacuum adsorption device for magnetorheological plane polishing and a processing method thereof, in particular to abrasive semi-fixed magnetorheological grinding and polishing under multi-stage vacuum adsorption for optical element planes. Background technique [0002] With the rapid development of aerospace, precision instruments, and optical technology, as well as the increasing demand for processing various high-precision plane, curved surfaces, and complex-shaped parts such as satellite attitude control and telemetry devices, lithography, and optoelectronic devices, the application of optoelectronic devices is increasingly Widely put forward higher requirements for the shape accuracy and surface accuracy of photoelectric component processing. Ultra-precision processing technology is a supporting technology for the optoelectronic device manufacturing industry. It is widely used in information technology, aerosp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B41/06B24B1/00
CPCB24B1/005B24B41/06
Inventor 潘继生于鹏阎秋生
Owner GUANGDONG UNIV OF TECH
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