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Preparation method and application of zinc nitride film, touch screen cover plate and film

A screen cover film and zinc nitride technology, which is applied in the input/output process of data processing, ion implantation plating, coating, etc., can solve the problems of low production efficiency, high production cost, and inability to achieve perfect fit.

Active Publication Date: 2018-07-13
SHANGHAI COPIOUS OPTICAL S & T CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is to overcome the relatively high surface reflectivity of the zinc nitride film prepared by the magnetron sputtering process in the prior art, and to prepare the light-shielding layer in the BM area of ​​the touch screen cover plate by screen printing using black ink. At the same time, the coating yield is low, the production cost is high, and the production efficiency is low. When the obtained product is laminated with a liquid crystal display, it is easy to generate bubbles and cannot achieve perfect bonding. A zinc nitride film and a touch screen cover are provided. and film preparation methods and applications

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  • Preparation method and application of zinc nitride film, touch screen cover plate and film
  • Preparation method and application of zinc nitride film, touch screen cover plate and film
  • Preparation method and application of zinc nitride film, touch screen cover plate and film

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Embodiment 1

[0071] The preparation method of the zinc nitride thin film of the present embodiment, it comprises the following steps:

[0072] Nitrogen is used as the sputtering gas and reaction gas, and zinc nitride film is formed by reactive sputtering with zinc target;

[0073] Among them, the working pressure of reactive sputtering is 4×10 -3 mbar; in the process of reactive sputtering, the coating power is 10kW; the thickness of zinc nitride film is 10nm; the purity of nitrogen gas is 99.99%, and the volume flow rate of nitrogen gas is 1000sccm; the purity of zinc target is more than 99.99%, and the consumption of zinc target is 1 rotating cathode zinc target; during reactive sputtering, the background vacuum is ≤9×10 -6 mbar, the distance between the zinc target and the substrate is 60mm, and the working temperature is preferably 80°C; in the process of reactive sputtering, the coating method is horizontal travel, and the line speed is 4m / min;

[0074] The present embodiment touch ...

Embodiment 2

[0085] The preparation method of the zinc nitride thin film of the present embodiment, except following conditions, other parameters or conditions are all identical with embodiment 1:

[0086] The working pressure of reactive sputtering is 5×10 -3 mbar; in the process of reactive sputtering, the coating power is 8kW; the thickness of zinc nitride film is 20nm; the volume flow rate of nitrogen gas is 900sccm; the amount of zinc target is 2 rotating cathode zinc targets; The distance between the target and the substrate is 50mm, the working temperature is preferably 50°C, the coating method is horizontal travel, and the line speed is 3m / min;

[0087] The present embodiment touch screen cover plate film, it comprises zinc nitride (Zn 3 N 2 ) film, silicon nitride (Si 3 N 4 ) film and a protective film; wherein, the thickness of the zinc nitride film is 20nm; the thickness of the silicon nitride film is 100nm, and the protective film is a conventional plastic protective film i...

Embodiment 3

[0093] The preparation method of the zinc nitride thin film of the present embodiment, except following conditions, other parameters or conditions are all identical with embodiment 1:

[0094] The working pressure of reactive sputtering is 2×10 -3 mbar; in the process of reactive sputtering, the coating power is 12kW; the thickness of zinc nitride film is 30nm; the volume flow rate of nitrogen gas is 1100sccm; the amount of zinc target is 2 rotating cathode zinc targets; The distance between the target and the substrate is 90mm, the working temperature is preferably 120°C, the coating method is horizontal travel, and the line speed is 2m / min;

[0095] The present embodiment touch screen cover plate film, it comprises zinc nitride (Zn 3 N 2 ) film, silicon nitride (Si 3 N 4 ) film and a protective film; wherein, the thickness of the zinc nitride film is 30nm; the thickness of the silicon nitride film is 150nm, and the protective film is a conventional plastic protective fil...

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Abstract

The invention discloses a zinc nitride film, a touch screen cover plate and a preparation method and application of the film. The preparation method of the zinc nitride thin film comprises the following steps that nitrogen serves as sputtering gas and reaction gas, and the zinc nitride thin film is formed through zinc target reactive sputtering; and work air pressure of reactive sputtering is 2x10<-3>-11 x10<-3> mbar, film coating power is 5-15 kW, and the thickness is 10-50 nm. The zinc nitride thin film is uniform and complete, the zinc element is nitrided completely, the surface reflectivity is low, and the zinc nitride thin film can be used for a BM area light shield layer of the touch screen cover plate. The touch screen cover plate is high in production efficiency, high in coating yield, low in production cost, high in surface hardness and high in scratch resistance and abrasion resistance. Surface energy is high, thus the touch screen cover plate can be effectively attached to a liquid crystal display, and the segment difference effect can be eliminated.

Description

technical field [0001] The invention relates to a zinc nitride film, a touch screen cover plate and a preparation method and application of the film. Background technique [0002] With the advancement of science and technology and the development of smart devices, the demand for touch screens as the main window of human-computer interaction has become more and more vigorous. In recent years, the annual shipments have shown explosive growth. With the technological innovation and fierce The competition in the world has put forward higher requirements for the production technology and cost of the touch screen. As the main functional component of the touch screen, the optical cover of the touch screen has high requirements on the production technology and production cost of the optical cover area of ​​the BM area (Black Matrix). [0003] The light-shielding layer in the BM area of ​​the traditional touch screen cover is mainly realized by the screen printing technology of black...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/08C23C14/34G06F3/041
CPCC23C14/0036C23C14/086G06F3/041G06F2203/04103
Inventor 陈君李涛
Owner SHANGHAI COPIOUS OPTICAL S & T CO LTD