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Plasma in-situ characterization method

A plasma and characterization technology, applied in radiation pyrometry, instruments, digital variable display, etc., can solve problems such as difficulties in characterization of plasma states

Inactive Publication Date: 2016-10-26
CHINA PETROLEUM & CHEM CORP +1
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Problems solved by technology

[0005] In order to solve the difficult problem of plasma state characterization in the prior art, the present invention provides a plasma in-situ characterization method

Method used

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  • Plasma in-situ characterization method

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Embodiment Construction

[0015] Combine below figure 1 The present invention will be described in detail.

[0016] A plasma in-situ characterization method, which uses an emission spectrometer 1, an infrared imager 4, a high-speed image capture system 2 and a digital oscilloscope 3 to characterize the plasma in a plasma discharge reactor; the characterization method is as follows:

[0017] In the first step, the optical fiber probe of the emission spectrometer 1 is placed in the discharge core area of ​​the plasma discharge reactor, and the active species that can de-excite and radiate photons during the plasma discharge process are monitored online. The position of the spectral peak qualitatively describes the type of active species in the plasma, on the other hand, the intensity of the spectral peak can quantitatively describe the amount of active species in the plasma. The second image collector of the infrared imager 4 is directed towards the plasma discharge core area to monitor the temperature ...

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Abstract

Disclosed is a plasma in-situ characterization method. An emission spectrometer, a high-speed image capture system, a digital oscilloscope, an infrared imaging device and an online mass spectrometer are used for performing characterization on plasma. A fiber-optic probe and a first image collector are both arranged on a discharge core region of a plasma discharging reactor. A voltage probe affiliate high-voltage electrode of the digital oscilloscope is connected with a high-voltage electrode of the plasma discharge reactor. A voltage probe affiliate grounding electrode is connected with a ground electrode, and a current probe is connected with the plasma discharge reactor. A second image collector faces the plasma discharge core region. A sample inlet tube of the online spectrometer is connected with an outlet of the plasma discharge reaction region. According to the plasma in-situ characterization method, all components are synergized and cooperated, varieties and the number of plasma active species, plasma discharging status, current and voltage waveforms, plasma electronic density, plasma region temperature distribution, product composition and the like can be monitored comprehensively in real time, and in-situ characterization can be performed in the plasma discharge process.

Description

technical field [0001] The invention relates to a plasma characterization method, in particular to a plasma in-situ characterization method. Background technique [0002] Plasma is an aggregate composed of charged particles and various neutral particles, and its positive and negative charges are equal, so it is electrically neutral macroscopically. Plasma is the fourth form of matter besides solid, liquid and gas. More than 99% of matter in the universe exists in a plasma state. Artificial plasma can be obtained by gas or liquid discharge. Discharge methods include dielectric barrier discharge, corona discharge, spark discharge, glow discharge and arc discharge. Plasmas are unique in that they activate molecules with energetic electrons. [0003] At present, plasma technology has been applied in many fields, such as nuclear fusion power generation, spray coating, surface modification of materials, thin film deposition and etching, preparation of particulate materials, et...

Claims

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Application Information

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IPC IPC(8): G01N21/27G01N21/84G01J5/00G01N27/62G01R13/02
CPCG01J5/00G01N21/27G01N21/84G01N27/62G01R13/02G01J5/485
Inventor 张婧石宁徐伟孙峰金满平朱云峰
Owner CHINA PETROLEUM & CHEM CORP
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