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Optical heterogeneity measurement device and method based on dual wavelength fizeau interferometer

A Fizeau interferometer, non-uniformity technology, applied in the field of optical measurement, can solve the problems of cumbersome steps and easy to be disturbed by air

Inactive Publication Date: 2016-11-09
NANJING UNIV OF SCI & TECH
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Problems solved by technology

[0004] The purpose of the present invention is to provide an optical non-uniformity measurement device and method based on a dual-wavelength Fizeau interferometer, which solves the problems of cumbersome steps and susceptibility to air disturbance in traditional absolute measurement methods

Method used

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  • Optical heterogeneity measurement device and method based on dual wavelength fizeau interferometer
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  • Optical heterogeneity measurement device and method based on dual wavelength fizeau interferometer

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Embodiment 1

[0128] An optical non-uniformity measurement device based on a dual-wavelength Fizeau interferometer, using the central wavelength of the first laser 1 as λ 1 = 632.8nm frequency-stabilized polarized helium-neon laser with output power of 1.5mw and output spot diameter of φ1mm; the central wavelength of the second laser 2 is λ 2 = 532nm frequency-stabilized polarization semiconductor laser, power 1.5mw, output spot diameter φ1mm. The plane mirror 13 to be tested is a quartz crystal, the diameter of the quartz crystal is D=110mm, the thickness d=21.70mm, and the wedge angle is 11'49''. The plane mirror 13 to be measured is at wavelength λ 1 = Refractive index n at 632.8nm 1 =1.4570, at wavelength λ 2 = Refractive index n at 532nm 2 = 1.4607. The light beam is reflected by the deflection mirror 3, and the beam spot diameter is φ8mm after the laser beam expander 5, and then reflected by the deflection mirror 7, collimated by the collimating objective lens 8 to form a beam of...

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Abstract

The invention discloses an optical heterogeneity measurement device and method based on a dual wavelength fizeau interferometer. With the dual wavelength fizeau interferometer, interferograms of a reference light wave and a light wave reflected by the front surface of a to-be-tested flat mirror are sequentially collected, and wavefront aberration data [delta]W11(x,y) and [delta]W21(x,y) corresponding to wavelengths [Lambda]1 and [Lambda]2 are obtained by first phase shift measurement; interferograms of the reference light wave and a light wave passing through the to-be-tested flat mirror and reflected by the rear surface of the to-be-tested flat mirror are collected, and wavefront aberration data [delta]W12(x,y) and [delta]W22(x,y) corresponding to the wavelengths [Lambda]1 and [Lambda]2 are obtained by phase shift measurement; and a difference value is calculated by the wavefront aberration data corresponding to the wavelengths obtained by two-stepped measurement, and the optical heterogeneity of the to-be-tested flat mirror is obtained. The invention does not require a standard reflector, and completely eliminates influences of the surface shape of the standard reflector on measurement results. The measurement steps are simple, and the defects that the traditional absolute measurement method has tedious steps and is vulnerable to air disturbance are tackled.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, in particular to an optical non-uniformity measurement device and method based on a dual-wavelength Fizeau interferometer. Background technique [0002] Optical transmission materials are an important part of optical materials, and their optical properties play an important role in the entire optical system. The indicators used to evaluate the performance of optically transparent materials include dispersion, surface shape, optical non-uniformity, radius of curvature, stress birefringence, stripes and bubbles, etc. Among them, optical non-uniformity reflects the inconsistency of the refractive index inside the same piece of optical material. If the internal refractive index of the optical material is inconsistent, it will cause the change of the transmitted wavefront, change the wave aberration of the optical system, and then affect the performance of the optical system. The optical...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02
Inventor 高志山王凯亮成金龙王伟王帅袁群杨忠明朱丹窦建泰叶井飞
Owner NANJING UNIV OF SCI & TECH
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