A kind of germanium silicon separation method

A separation method, germanium-silicon technology, applied in the direction of photographic technology, instrument, photographic auxiliary process, etc., can solve the problems of large alkali consumption and acid consumption, low recovery rate of Ge, large amount of waste water treatment, etc., so as to improve the recovery rate and avoid Filtration is difficult and the effect of reducing emissions

Inactive Publication Date: 2018-06-29
GUIZHOU HONGDA ENVIRONMENTAL PROTECTION TECHNOLOGY CO LTD
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  • Claims
  • Application Information

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Problems solved by technology

However, this method has a long process flow, a large amount of alkali and acid consumption, and at the same time as silicon removal, Ge loss is large, and more than 30% of Ge enters the silicon removal slag, the Ge recovery rate is low, filtration is difficult, the amount of wastewater treatment is large, and the production cost also higher

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  • A kind of germanium silicon separation method

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Effect test

Embodiment 1

[0026] Such as figure 1 Shown, a kind of germanium silicon separation method comprises the following steps:

[0027] (1) After the germanium-silicon-containing material is ball-milled, the sodium hydroxide solution with a mass fraction of 27% is used for a leaching treatment for 2.1 hours, and it is filtered to obtain a primary filter residue and a primary filtrate; Carry out secondary leaching treatment for 18% sodium hydroxide solution, the leaching treatment time is 2.5h, and then filter it to obtain secondary filter residue and secondary filtrate; return the secondary filter residue to the rotary kiln for processing, and then return it to In the germanium-silicon-containing material, further processing is carried out; the secondary filtrate is returned to the primary leaching treatment, and after being mixed with the sodium hydroxide solution, the germanium-silicon-containing material is subjected to a primary leaching treatment;

[0028] (2) Primary filtrate treatment: t...

Embodiment 2

[0039] Such as figure 1 Shown, a kind of germanium silicon separation method comprises the following steps:

[0040](1) After the germanium-silicon-containing material is ball-milled, a sodium hydroxide solution with a mass fraction of 25% is used for a leaching treatment for 2.5 hours, and it is filtered to obtain a primary filter residue and a primary filtrate; Carry out secondary leaching treatment for 20% sodium hydroxide solution, the leaching treatment time is 2h, then it is filtered to obtain secondary filter residue and secondary filtrate; the secondary filter residue is returned to the rotary kiln for processing, and then returned to the containing In the germanium-silicon material, further processing is carried out; the secondary filtrate is returned to the primary leaching treatment, and after being mixed with the sodium hydroxide solution, the germanium-containing silicon material is subjected to a primary leaching treatment;

[0041] (2) Primary filtrate treatmen...

Embodiment 3

[0052] Such as figure 1 Shown, a kind of germanium silicon separation method comprises the following steps:

[0053] (1) After the germanium-silicon material is ball milled, use a sodium hydroxide solution with a mass fraction of 30% to carry out a leaching process for 3 hours, and filter it to obtain a filter residue and a filtrate; a filter residue with a mass fraction of 30% sodium hydroxide solution is used for secondary leaching treatment, the leaching treatment time is 3h, and then it is filtered to obtain secondary filter residue and secondary filtrate; the secondary filter residue is returned to the rotary kiln for processing, and then returned to the germanium-containing In the silicon material, further treatment is performed; the secondary filtrate is returned to the primary leaching treatment, and after being mixed with the sodium hydroxide solution, the germanium-containing silicon material is subjected to a primary leaching treatment;

[0054] (2) Primary filtrat...

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Abstract

The invention relates to the technical field of germanium silicon separation in germanium and silicon-containing raw materials, in particular to a germanium silicon separation method. According to the germanium silicon separation method, through carrying out ball milling on germanium and silicon-containing materials, adopting a sodium hydroxide solution in the environment with a certain temperature, and limiting the liquid-solid ratio, germanium and silicon in the germanium and silicon-containing materials are leached, and the coating of silicon dioxide lattices for germanium is destroyed; and germanium and silicon leaching solutions are subjected to electrolytic separation through adopting an electrolytic method, and the separation rate of germanium and silicon reaches 90% or above.

Description

technical field [0001] The invention relates to the technical field of separating germanium and silicon from raw materials containing germanium and silicon, in particular to a method for separating germanium and silicon. Background technique [0002] Ge-containing high-silicon raw materials, generally containing SiO 2 More than 5%, and the content of Ge is only a few ten-thousandths to a few ten thousandths. The traditional process of extracting Ge from high-silicon raw materials is to use the fire method to reduce and volatilize, and the H 2 SO 4 Leaching, extraction or tannin precipitation of Ge, because most of Ge in high-silicon raw materials is covered by SiO 2 Packing, fire reduction and volatilization still has a considerable part of Ge entering the smoke and dust in the state of packing. with H 2 SO 4 leaching, the Ge in the package is not leached, so that the leaching recovery rate of Ge is affected, and in severe cases, it can reach more than 50% and cannot b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22B3/12C22B41/00C25C1/22
CPCY02P10/20
Inventor 李世平倪常凯陈磊王志斌
Owner GUIZHOU HONGDA ENVIRONMENTAL PROTECTION TECHNOLOGY CO LTD
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