Method for removing silicon from nickel solution through deep purification

A technology of deep purification and nickel solution, applied in the direction of improving process efficiency, can solve the problem of lack of nickel solution deep silicon removal method, etc., and achieve the effect of good impurity removal effect, cost reduction and high recovery rate

Inactive Publication Date: 2016-12-07
JINCHUAN GROUP LIMITED
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The technical problem to be solved by the present invention is to provide a method for deep purification of nickel solution to remove silicon, so as to solve the problem of lack of deep silicon removal in nickel solution in the prior art

Method used

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  • Method for removing silicon from nickel solution through deep purification
  • Method for removing silicon from nickel solution through deep purification
  • Method for removing silicon from nickel solution through deep purification

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Weigh 5 g of sodium hydroxide, add 20 mL of water to prepare a 250 g / L sodium hydroxide solution, and take 1 L of silicon-containing nickel sulfate solution.

[0020] Solution heating: Put the silicon-containing nickel sulfate solution in a container and heat it to 50°C.

[0021] Adjust the pH value: add an appropriate amount of alkaline substances, and stir evenly during the addition of alkaline substances until the pH value of the solution remains at 4. When the pH value of the solution is stable, continue to stir for 2 hours.

[0022] Separation of reactants: vacuum suction filtration is performed on the substance that has been operated in step B to obtain purified nickel solution and nickel hydroxide slag. The nickel hydroxide slag can be reused 3 to 4 times after being washed 2 to 3 times with hot pure water. The nickel hydroxide slag is all added to the solution to be removed before adding the sodium hydroxide solution.

[0023] The comparison of solution indica...

Embodiment 2

[0027] Weigh 8 g of sodium hydroxide, add 20 mL of water to prepare a 400 g / L sodium hydroxide solution, and take 2 L of silicon-containing nickel chloride solution.

[0028] Solution heating: Put the silicon-containing nickel chloride solution in a container and heat it to 80°C.

[0029] Adjust the pH value: add an appropriate amount of alkaline substances, the process of adding alkaline substances is accompanied by uniform stirring, until the pH value of the solution remains at 5, when the pH value of the solution is stable, continue to stir for 10 hours.

[0030] Separation of reactants: vacuum suction filtration is performed on the substance that has been operated in step B to obtain purified nickel solution and nickel hydroxide slag.

[0031] The nickel hydroxide slag can be reused 3 to 4 times after being washed 2 to 3 times with hot pure water. The nickel hydroxide slag is all added to the solution to be removed before adding the sodium hydroxide solution.

[0032] Th...

Embodiment 3

[0036] Weigh 150 g of sodium hydroxide, add 375 mL of water to prepare a 400 g / L sodium hydroxide solution, and take 70 L of silicon-containing nickel-cobalt sulfate solution.

[0037] Solution heating: Put silicon-containing nickel-cobalt sulfate in a container and heat to 70°C.

[0038] Adjust the pH value: add an appropriate amount of alkaline substances, and the process of adding alkaline substances is accompanied by uniform stirring until the pH value of the solution remains at 5.5. When the pH value of the solution is stable, continue to stir for 5 hours.

[0039] Separation of reactants: press-filter the material that has been operated in step B to obtain purified nickel solution and nickel hydroxide slag.

[0040] The nickel hydroxide slag can be reused 3 to 4 times after being washed 2 to 3 times with hot pure water. The nickel hydroxide slag is all added to the solution to be removed before adding the sodium hydroxide solution.

[0041] The comparison of solution i...

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Abstract

The invention relates to the technical field of solution impurity removal, in particular to a method for removing silicon from a nickel solution through deep purification. The method includes the three steps of heating the solution, adjusting the PH value and separating reactants. Nickel hydroxide slag obtained in the reactant separation step can be used for the PH value adjusting step, and the preliminarily generated nickel hydroxide slag can be repeatedly used three to four times. The method is particularly suitable for a nickel sulfate solution or a nickel chloride solution or a mixed solution of nickel sulfate and nickel chloride or a nickel-cobalt sulfate solution or a mixed solution of nickel-cobalt sulfate and nickel chloride. The total concentration of nickel is 15-75 g / L, and the content of silicon is 0.1-1 g / L.

Description

technical field [0001] The invention relates to the technical field of solution removal of impurities, in particular to a method for deeply purifying and removing silicon from a nickel solution. Background technique [0002] The nickel solution obtained in nickel hydrometallurgy contains impurities such as cobalt, calcium, magnesium, lead, and silicon. Usually, the cobalt, calcium, magnesium, and lead are targeted for removal of impurities by extraction and precipitation methods before being used for nickel plates And the preparation of nickel salt crystals, but there is no corresponding treatment process for impurity silicon, and the silicon content in the system is maintained between 0.5 and 1g / L. With the continuous application of nickel salt products in lithium-ion battery cathode materials, the requirements for its impurity content are getting higher and higher, especially impurity silicon, which will inevitably be reintroduced in the production process, so the requirem...

Claims

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Application Information

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IPC IPC(8): C22B3/44C22B19/20
CPCC22B3/44C22B19/26Y02P10/20
Inventor 王甲琴柴艮风李兰兰王国超常雪洁甘梅胡敏艺
Owner JINCHUAN GROUP LIMITED
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