Multilayer graphene quantum carbon-based semiconductor material prepared from PI film, and preparation method for multilayer graphene quantum carbon-based semiconductor material
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SHENZHEN DANBOND TECH
- Publication Date
- 2016-12-07
Abstract
Description
technical field
[0001] The invention relates to the field of graphene semiconductor materials, in particular to a method for preparing a multilayer graphene quantum carbon-based two-dimensional semiconductor material. Background technique
[0002] Two-dimensional nanocarbon materials, especially graphene quantum carbon-based semiconductor materials, have attracted more and more attention. They have extremely excellent electrical, optical, magnetic, thermal and mechanical properties, and are ideal nanoelectronic and optoelectronic materials. The graphene quantum carbon-based semiconductor material has a special geometric structure, so that the electronic state near the fermion surface is mainly an extended π state. Due to the lack of surface dangling bonds and the defects of the surface nano-carbon structure, the scattering of the extended π state hardly affects electrons. Transport in the material, the mobility of electrons and holes in multilayer graphene at room temperatur...