Multilayer graphene quantum carbon-based semiconductor material prepared from PI film, and preparation method for multilayer graphene quantum carbon-based semiconductor material

A kind of ene quantum and two-dimensional semiconductor technology, applied in the field of graphene semiconductor materials, can solve the problems of inability to carry out industrialization process and inability to make logic circuits, and achieve low cost, large area, in-plane dispersion and small deviation.
CN106206682AActive Publication Date: 2016-12-07SHENZHEN DANBOND TECH

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
SHENZHEN DANBOND TECH
Publication Date
2016-12-07
Patent Text Reader

Abstract

The invention provides a multilayer graphene quantum carbon-based semiconductor material prepared from a PI film, and a preparation method for the multilayer graphene quantum carbon-based semiconductor material. The preparation method comprises the steps of S1, taking the PI film as a raw material, performing polymer sintering at a first temperature, and removing H, O and N atoms to form a carbon precursor; and S2, adjusting the first temperature to a second temperature, and performing graphitization on the carbon precursor to form the multilayer graphene quantum carbon-based two-dimensional semiconductor material, wherein at least in the step S2, nano metal material doping is carried out to form quantum dots in multilayer graphene. The multilayer graphene quantum carbon-based two-dimensional semiconductor material prepared by the method adopts a hexagonal planar net molecular structure, is orderly arranged, and has flexibility, high tortuosity ratio, and quite low in-plane dispersity and degree of deviation; band gaps are formed through nano metal doping, and are controllable; and in addition, by adoption of the preparation method, the large-area, low-cost, large-batch and roll-to-roll continuous production can be realized.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to the field of graphene semiconductor materials, in particular to a method for preparing a multilayer graphene quantum carbon-based two-dimensional semiconductor material. Background technique

[0002] Two-dimensional nanocarbon materials, especially graphene quantum carbon-based semiconductor materials, have attracted more and more attention. They have extremely excellent electrical, optical, magnetic, thermal and mechanical properties, and are ideal nanoelectronic and optoelectronic materials. The graphene quantum carbon-based semiconductor material has a special geometric structure, so that the electronic state near the fermion surface is mainly an extended π state. Due to the lack of surface dangling bonds and the defects of the surface nano-carbon structure, the scattering of the extended π state hardly affects electrons. Transport in the material, the mobility of electrons and holes in multilayer graphene at room temperatur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More