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Display method of target material metallographic structure

A technology of metallographic structure and display method, which is applied in the preparation of test samples, etc., can solve the problems of difficult control of metallographic structure corrosion rate, unclear grain boundary, and influence on the observation of metallographic structure, etc., to achieve good display effect, The effect of clear grain boundary morphology and easy observation

Inactive Publication Date: 2017-01-04
KONFOONG MATERIALS INTERNATIONAL CO LTD
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Problems solved by technology

[0004] However, the etchant used in this method is not easy to control the corrosion rate of the metallographic structure, so that the grain boundaries of the sample are not clear enough, which affects the subsequent observation of the metallographic structure, especially for high-purity metal materials.

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  • Display method of target material metallographic structure

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Embodiment Construction

[0029] In the prior art, the method of displaying the metallographic structure of high-purity tungsten targets generally uses a mixture of nitric acid, sulfuric acid and hydrofluoric acid as an etchant, but the corrosion rate of the etchant to the metallographic structure is not easy to control, and the corrosion The grain boundary of the final sample is not clear enough, which affects the subsequent observation and analysis of the metallographic structure.

[0030] In order to solve the problem that the metallographic structure of the tungsten target is not clear in the prior art, the inventors of the present invention further optimized the corrosion process of the tungsten target sample, which specifically includes: providing a tungsten target, from the tungsten target cutting a part of the material as a sample; carrying out surface treatment on the sample to form at least one polished surface; using an etchant composed of hydrogen peroxide and ammonia water to corrode the po...

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Abstract

The invention provides a display method of a target material metallographic structure. The display method comprises the following steps: providing a tungsten target material; cutting a part of the tungsten target material as a test sample; performing surface treatment on the test sample, and forming at least one polished surface; corroding the polished surface of the test sample by adopting etching agent formed by hydrogen peroxide and ammonia water; and performing metallographic observation on the test sample by adopting a metallographic microscope. The etching agent formed by the hydrogen peroxide and the ammonia water is stable in reaction and good in corrosion effect, and the crystal boundary morphology of the corroded test sample is clear, so that the metallographic structure of the test sample is good in display effect, and the observation on the metallographic structure by adopting the metallographic microscope is facilitated.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to the technical field of targets, in particular to a method for displaying the metallographic structure of targets. Background technique [0002] With the development of science and technology, the demand for high-purity metals in industrial production is increasing. At the same time, the requirements for material properties such as hardness, strength, and ductility of high-purity metal materials are also increasing. The internal organizational structure is directly and closely related to material properties such as hardness, strength, and ductility, so it is extremely important to study the internal organizational structure of materials. Metallographic observation is the most direct and effective method to study the internal structure of metal materials, which is usually revealed by using etchant corrosion. [0003] In the current semiconductor field, tungsten target is one of the m...

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Application Information

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IPC IPC(8): G01N1/32
Inventor 姚力军潘杰相原俊夫大岩一彦王学泽胡淼锡
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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