A preparation method of disordered gain medium based on nanoporous structure
A gain medium and nanoporous technology, which is applied in the direction of active dielectric materials, laser components, electrical components, etc., can solve the problems of unfavorable large-scale promotion of nanometer active optical devices, complex process, expensive equipment, etc., and achieve low cost and high porosity Uniform shape and low cost
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[0022] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0023] The preparation of disordered gain medium based on nanoporous structure, the specific steps are as follows:
[0024] 1. The diameter of the selected silicon wafer is 1 inch, and the crystal orientation is [111] type, indicating that the unevenness is less than 1 micron. Rinse the substrate repeatedly with deionized water to remove physically adsorbed dust on the substrate; boil the substrate in concentrated sulfuric acid to remove organic impurities and metal oxides on the surface of the substrate; repeatedly rinse the substrate with deionized water; Then ultrasonically clean with acetone to remove all kinds of grease; boil the substrate in ammonia water to r...
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