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Heat dissipation substrate, heat dissipation device, and manufacturing method of heat dissipation substrate

A technology of heat dissipation substrate and manufacturing method, which is applied in the direction of electrical components, electric solid devices, circuits, etc., can solve the problems of increased manufacturing cost of heat dissipation substrates, reduced heat dissipation of heat dissipation substrates, and unestablished problems, achieving excellent heat dissipation efficiency, insulation and Excellent heat dissipation and reduced warpage

Inactive Publication Date: 2017-01-25
KOBE STEEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, it becomes difficult to bring cooling materials such as cooling fins or heating elements such as electronic components into close contact with the heat dissipation substrate, and as a result, there is a problem that the heat dissipation performance of the heat dissipation substrate decreases.
[0011] These disadvantages can be eliminated by reducing the warpage of the heat dissipation substrate, but there is no established index as to how much the warpage can be reduced to obtain sufficient heat dissipation efficiency
Therefore, there are disadvantages in that excessive processing is performed to reduce the warpage of the heat dissipation substrate, which increases the manufacturing cost of the heat dissipation substrate, and on the other hand, the reduction of warpage is not sufficient, resulting in insufficient heat dissipation efficiency.

Method used

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  • Heat dissipation substrate, heat dissipation device, and manufacturing method of heat dissipation substrate
  • Heat dissipation substrate, heat dissipation device, and manufacturing method of heat dissipation substrate
  • Heat dissipation substrate, heat dissipation device, and manufacturing method of heat dissipation substrate

Examples

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Embodiment approach

[0142] This heat dissipation substrate may be manufactured by performing a correction step after formation to correct warpage as in the above embodiment, or may be manufactured while adjusting the thickness of the inorganic material layer to reduce warpage. In this case, there is no need to adjust warpage after manufacture.

[0143] Alternatively, the coating may be laminated after the rectification step. In this way, by laminating the coating layer after the warpage is corrected, microcracks generated in the inorganic material layer can be filled with the coating layer, and the insulation of the heat dissipation substrate can be efficiently improved.

[0144] [Other implementations]

[0145]The heat dissipation substrate, the device, and the method of manufacturing the heat dissipation substrate are not limited to the embodiments described above.

[0146] The heat dissipation substrate may have multiple layers of base materials or inorganic material layers in the thickness ...

Embodiment 1

[0151]

[0152] An aluminum plate (industrial pure aluminum 1050, average thickness 2 mm) as a base material was cut into a length of 50 mm and a width of 50 mm using a shirring processing machine, and the surface was cleaned with a neutral detergent.

[0153] Next, using a ball mill, low-melting phosphate glass flakes (flake) ("VQ0028" of Nippon Frit Co., Ltd.), which is phosphate glass, were pulverized so that the median particle size became 20 μm, and viscous glass was obtained. mixture particles. Alumina filler (Showa Denko's "Round Alumina AS-30", median diameter: 20 µm) was mixed as a filler into the binder particles at a mass ratio of 50:50. Water was added to the mixture and stirred to prepare an inorganic layer composition. The solid content concentration of this composition for inorganic substance layers was 60 mass %.

[0154] Next, low-melting-point phosphate glass chips ("VQ0028" of Nippon Frit Co., Ltd.) were pulverized using a jet mill so that the median par...

Embodiment 2 and 3

[0162] A heat dissipation substrate was obtained in the same manner as in Example 1 except that the type of the siloxane compound to be used and the drying temperature during coating formation were as described in Table 1.

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Abstract

The invention provides a heat dissipation substrate, a heat dissipation device, and a manufacturing method of a heat dissipation substrate. The heat dissipation substrate is provided with a base material adopting aluminum or aluminum alloy as main component, a heat conduction layer disposed on one surface of the base material and having insulation performance. The heat conduction layer is provided with an inorganic material layer, which comprises bonding agent adopting aluminum oxide as fillers of main components and phosphate glass as main components. The warping is small, and the insulation performance and the heat dissipation performance are excellent.

Description

technical field [0001] The invention relates to a heat dissipation substrate, a device and a manufacturing method of the heat dissipation substrate. Background technique [0002] In recent years, with the increase in power of electronic components, the amount of heat generated from electronic components has increased. For example, a high-brightness light-emitting diode (Light Emitting Diode, LED) locally generates high temperature, thereby resulting in a decrease in luminous efficiency, a change in luminous color, and component degradation. Therefore, the industry seeks to efficiently dissipate this heat. Now widely known is a heat-dissipating substrate in which an insulating and thermally conductive film is formed by adding a binder and a filler to the surface of a base material having excellent thermal conductivity in response to the above-mentioned requirements. Heat dissipation efficiency is improved by bringing the base material side into contact with a cooling materi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/367
CPCH01L23/367H01L23/3672H01L23/373H01L23/3736
Inventor 水野雅夫志田阳子
Owner KOBE STEEL LTD