InGaN/GaN multi-quantum well grown on glass substrate and preparation method therefor
A technology of glass substrate and multiple quantum wells, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of high price, high LED manufacturing cost, expensive sapphire and SiC substrates, etc., to achieve easy acquisition and reduce production cost, the effect of reducing the formation of dislocations
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Embodiment 1
[0041] figure 1Shown is a schematic cross-sectional view of the InGaN / GaN multiple quantum well grown on a glass substrate prepared in this embodiment, as shown in the figure, including an aluminum metal layer 11 grown on a glass substrate 10, and grown on the aluminum metal layer 11 The silver metal layer 12, the AlN buffer layer 13 grown on the silver metal layer 12, the GaN buffer layer 14 grown on the AlN buffer layer 13, the non-doped GaN layer 15 grown on the GaN buffer layer 14, the non-doped GaN layer 15 grown on the non- Doping the InGaN / GaN multiple quantum wells 16 on the GaN layer 15 .
[0042] The preparation method of the InGaN / GaN multiple quantum well grown on the glass substrate of the present embodiment comprises the following steps:
[0043] (1) Selection of substrate: use ordinary glass substrate;
[0044] (2) Substrate surface polishing and cleaning treatment;
[0045] The surface polishing of the substrate is specifically:
[0046] First, the surface ...
Embodiment 2
[0057] The preparation method of the InGaN / GaN multiple quantum well grown on the glass substrate of the present embodiment comprises the following steps:
[0058] (1) Selection of substrate: use ordinary glass substrate;
[0059] (2) Substrate surface polishing and cleaning treatment;
[0060] The surface polishing of the substrate is specifically:
[0061] First, the surface of the glass substrate is polished with diamond slurry, and the surface of the substrate is observed with an optical microscope until there are no scratches, and then the chemical mechanical polishing method is used for polishing;
[0062] The cleaning is specifically:
[0063] Put the glass substrate into deionized water and ultrasonically clean it at room temperature for 5 minutes to remove the dirt particles on the surface of the glass substrate, then wash it with acetone and ethanol in sequence to remove the surface organic matter, and dry it with high-purity dry nitrogen;
[0064] (3) Growth of t...
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