Preparation method of high-hydrophobicity and low-adhesion aluminum surface
A low adhesion, aluminum surface technology, applied in the direction of metal material coating process, etc., can solve the problems of complicated process, high cost, limited material matrix, etc., and achieve the effect of simple operation, improved hydrophobic performance, and simple and easy method
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Embodiment 1
[0021] Sand the aluminum substrate with a size of 20*20*2mm, ultrasonically clean it, and dry it in a drying oven to remove the oxide layer on the surface;
[0022] Prepare the surface micro-nano structure: put the pretreated aluminum base into 0.8mol / L hydrochloric acid solution, place the aluminum base in the solution for etching for 17 hours at room temperature, then ultrasonically clean and dry in a drying oven; then place Etched in 0.8mol / L cupric chloride solution for 3 minutes, then cleaned with ultrasonic and dried in oven.
[0023] Low surface energy: Put the etched aluminum base into the prepared 0.5mol / L stearic acid absolute ethanol solution, modify the aluminum base in a water bath at 53°C for 1 hour, and then place it in a drying oven Dry and solidify at 95°C for 30 minutes. The treated aluminum substrate is subjected to a drop test with a contact angle measuring instrument to measure the contact angle of static water droplets on the surface of the aluminum subst...
Embodiment 2
[0025] Sand the aluminum substrate with a size of 20*20*2mm, ultrasonically clean it, and dry it in a drying oven to remove the oxide layer on the surface;
[0026] Prepare the surface micro-nano structure: put the pretreated aluminum substrate into 0.8mol / L hydrochloric acid solution, place the aluminum substrate in the solution for etching for 18 hours at room temperature, then ultrasonically clean it and dry it with a drying oven; then place Etched in 0.8mol / L cupric chloride solution for 3 minutes, then cleaned with ultrasonic and dried in oven.
[0027] Low surface energy: Put the etched aluminum base into the prepared 0.5mol / L stearic acid absolute ethanol solution, modify the aluminum base in a water bath at 53°C for 1 hour, and then place it in a drying oven Dry and solidify at 95°C for 30 minutes, and use a contact angle measuring instrument to conduct a drop test on the treated aluminum substrate to measure the contact angle of static water droplets on the surface of...
Embodiment 3
[0029] Sand the aluminum substrate with a size of 20*20*2mm, ultrasonically clean it, and dry it in a drying oven to remove the oxide layer on the surface;
[0030] Prepare the surface micro-nano structure: put the pretreated aluminum base into 0.8mol / L hydrochloric acid solution, etch the aluminum base in the solution for 20 hours at room temperature, then ultrasonically clean it and dry it in a drying oven; Etched in 0.8mol / L cupric chloride solution for 3 minutes, then cleaned with ultrasonic and dried in oven.
[0031] Low surface energy: Put the etched aluminum base into the prepared 0.5mol / L stearic acid absolute ethanol solution, modify the aluminum base in a water bath at 53°C for 1 hour, and then place it in a drying oven After drying and curing at 95°C for 30 minutes, the treated aluminum substrate was subjected to a drop test using a contact angle measuring instrument to measure the contact angle of static water droplets on the surface of the aluminum substrate. The...
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